| The use of plasma sources for manufacturing has been growing in the last years. Among these sources, helicon sources are known for their great efficiency [1]. The need to cover large substrates has led to the development of new sources that can produce not only high-density plasmas but high uniformity over a large area [8, 9, 10]. Among these large-area plasma sources, the use of single helicon sources in an array has showed good results [9]. However, the use of electromagnets to provide the necessary background magnetic field has limited the size of these machines.;In this research work, the use of permanent magnets not only to provide the background magnetic field but also to inject the plasma downstream has shown excellent results. Furthermore, optimization of single helicon sources has been achieved using the HELIC code [24]. Finally, these single helicon sources have been arranged in certain configurations to achieve densities above 1011 cm-3 at seven inches below them with a ripple in uniformity of less than 3% over an arbitrary large area. |
