Research On The Analysis And Compensation Methods Of The Image Quality In Lithographic Projection Lens

For the development of very large scale integrated circuit and the domestic needs of the very scale integrated circuit industrialization, and in order to meet the demands for the development technology of manufacturing equipment to be used for the very large scale integrated circuit, the paper studies on the analysis and compensation methods for the high numerical aperture and wavelength 193 nm lithographic projection lens.Aiming at the lithographic projection lens, the paper carries out the following main research contents:The first part is the analysis and compensation methods of the wavefront aberrations. The paper proposes to use Legendre polynomials to express the wavefront aberrations, so as to establish the relationships between the wavefront aberrations and the field. The expressions provide a method to study the analysis and compensation of the wavefront aberrations. The paper studies the relationships of the wavefront aberrations and the image position, and deduces the conversion coefficients of the wavefront aberrations and the image position. The conversion coefficients improve the conversion accuracy of the image position and the wavefront aberrations. The paper studies on the characteristics of the different working circumstances of the lithographic projection lens(such as temperature, pressure, vibration, wavelength, etc.). The paper analyzes the influence laws of the image quality in various kinds of circumstances and develops the compensation methods of the image quality. The favorable influence laws are used to compensate the image quality. The compensations are realized by controlling environmental factors.The second part is the analysis and compensation methods of the distortion. The paper proposes to express the distortion by means of decomposing orthogonally the distortion into the Cartesian coordinates and the Legendre polynomials, so as to establish the relationships between the distortion and the field. The twice distortion decompositions enrich the distortion types. The expressions provide a method for the study of the distortion analysis and compensation methods. The paper also studies on the telecentricity to effect on the distortion. And the spheric stop is used to control the telecentricity of the lithographic projection lens to reduce the distortion effected on by the defocus. The paper deduces the distortion of lithographic projection lens effected on by the alignment errors of the reticle in the optical lithography and analyzes the distortion caused by the coma in the typical conditions.The third part is the analysis and controlling methods of the flare. The paper researches the flare effected on by the optical mid-frequency surface errors. Power spectral density is used to describe the mid-spatial frequency surface errors and analyze the flare. The concept of equivalent spatial frequency pupil is used to analyze tolerance. At the same time, the paper analyzes the consistency of the numerical aperture, and puts forward to use the vice stop to improve the numerical aperture consistency.In the paper, the core requirements of the lithographic projection lens are researched, and the methods of the analysis and compensation are proposed. The analysis methods can be used to evaluate the satisfaction of the requirements of the lithographic projection lens. The application of the compensation methods can reduce the demands of the tolerance, improve the practicability of manufacturing the lithographic projection lens to achieve, and reduce the research and production costs of the lithographic projection lens. The results of the researches on the lithographic projection lens are the references to be provided for the people that they engage in the fields about researching on and producing and using the lithographic projection lens.