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Study On Super-resolution Imaging And Nano-lithography Of Curved Multilayered Metal-Dielectric Structure

Posted on:2011-05-19Degree:DoctorType:Dissertation
Country:ChinaCandidate:J G HuFull Text:PDF
GTID:1118360305466617Subject:Optics
Abstract/Summary:PDF Full Text Request
In this dissertation, based on the derived effective media theory and dispersive equation in cylindrical coordinate, sub-diffraction-limit imaging mechanism and its conditions of the curved metal-dielectric-metal structure was analyzed. The dependence of sub-diffraction-limit imaging properties on dielectric constant, geometry and surrounding media of the curved metal-dielectric-metal structure was discussed. Impedance-matching method was used to improve the resolution of the curved metal-dielectric-metal structure. The near-field lithography method based on the curved metal-dielectric structure was designed and studied, and impedance-matching method was also adopted to increase the lithography resolution. The focusing of the tapered metal-dielectric-metal waveguide arrays was designed and investigated, the dynamic control of beam focusing was realized.The main research works and conclusions are as following:1. Based on the effective media theory in cylindrical coordinate, dispersive equation of the curved metal-dielectric-metal super-resolution structure was obtained. The dependence of the energy flux on dispersive relation of the structure was discussed, and sub-diffraction-limit imaging mechanism of the curved metal-dielectric-metal structure was demonstrated. Researches above will be of significance in parameter design of the super-resolution curved metal-dielectric-metal structure and its optimization.2. Dispersive FDTD and the finite element method (FEM) of the electromagnetic field simulation software was built, which can accurately simulate the optical phenomena related to metal-dielectric-metal multilayered structure. The dependence of sub-diffraction-limit imaging properties on dielectric constant, geometry, source position, wavelength and surrounding media of the structure was discussed. Impedance-matching was taken to improve the resolution of the curved metal-dielectric structure, and the contrast ratio of the image is enhanced to four times of the no impedance-matching circumstances.3. FEM numerical simulation was used to study the influence of the dielectric constant, wavelength of the incident light, and the surrounding media of the curved metal-dielectric-metal structure on nano-lithography effect. According to law of the impedance-matching, a new method using water as impedance-matching media was proposed to improve the near-filed lithography quality, and it has been verified by FEM numerical simulation. Taking use of this method,40nm photolithography resolution and 0.39 intensity contrast ratio was achieved.4. The focusing of the tapered metal-dielectric-metal waveguide arrays was designed and investigated. The dynamic control of beam deflection, focusing was studied by modulating angle of the incident light and the tapered angle of the structure. Large modulating ranges of deflection focusing angle (45°) was achieved; furthermore, focusing distance (>3.5μm), the facula radius (<170nm) was obtained by the cylindrical tapered multilayered metal-dielectric-metal waveguide arrays with the radial polarization illumination.
Keywords/Search Tags:curved metal-dielectric-metal, negative refraction, super-resolution, dispersive finite-difference time-domain method, finite element method, sub-wavelength structure, nano-lithography, near-field focusing
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