Keyword [chemical mechanical planarization] Result: 21 - 34 | Page: 2 of 2 21.  Chemical mechanical planarization: Synchronous, in situ measurements of the coefficient of friction, wafer orientation and material removal rate 22.  In-situ flow visualization during chemical mechanical planarization: A feasibility study 23.  Sensor based modeling of chemical mechanical planarization (CMP) of copper for semiconductor applications 24.  Chip scale modeling of chemical mechanical planarization (CMP) for layout dependent variation 25.  In-situ process monitoring and orientation effects-based pattern design for chemical mechanical planarization 26.  Wireless sensor fusion approach for monitoring chemical mechanical planarization (CMP) process 27.  Integrated modeling of chemical mechanical planarization/polishing (CMP) for integrated circuit fabrication: From particle scale to die and wafer scales 28.  Model predictive run-to-run control of chemical mechanical planarization 29.  Study On Weakly Alkaline Basic Chemical Mechanical Planarization Materials And Mechanism For Integrated Circuit Cobalt Plugs 30.  Study On Material Removal Rateselectivity In GLSI Copperinterconnect Barrier Cobalt CMP 31.  Research On CMP Of Cobalt Barrier In Integrated Circuit Copper Interconnection Technology 32.  Research On CMP Slurrys For TSV Wafers 33.  Study On The Selectivity Of Removal Rate Of Barrier CMP For Integrate Circuit Cobalt Plugs 34.  Study On The Control Of Dishing And Erosion In GLSI Multilayer Copper Interconnect   <<First  <Prev  Next>  Last>>  Jump to

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