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Keyword [high-k]
Result: 181 - 200 | Page: 10 of 10
181. Fabrication Of MoS2 Transistor By Exfoliation And CVD Methods And Device Simulation
182. Study On The Preparation And Performance Of Inkjet-Printed NiO TFT
183. Studies On The Electrical Characteristics Of ALD-Grown Hafnium Oxide Thin-Film Devices
184. Studies Of Flash Memories Based On O3-Al2O3 Prepared By Atomic Layer Deposition
185. Side Trench Field Plate Of SOI Lateral Power Devices
186. Research On The Preparation And Performance Of Metal Oxide Nanofiber Transistors
187. Preparation Of Metal Oxide Nanofiber Field-effect Transistor And Regulation Of Electrical Performance
188. A study of group III elements (lanthanum, gadolinium, europium, and aluminum) incorporation on metal gate/high-k stacks for advanced CMOS applications
189. Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors
190. Atomic Layer Deposition of Platinum Nano-particles and High-k Dielectrics for Non-volatile Charge Storage Memory Devices
191. New quantum cascade laser architectures: II-VI quantum cascade emitters, high k-space lasing, and short injectors
192. Multilayer filter design with high K materials
193. Alternative materials for next-generation transistors: High-k/germanium-based MOSFET
194. Atomic scale experimental and theoretical studies of high-k gate dielectric interfaces
195. Bilayer metal gate electrodes with tunable work function: Behavior, mechanism, and device characteristics
196. Atomic layer deposition of lanthanum based oxides for high-K gate dielectric applications
197. Gallium arsenide and indium gallium arsenide MOS devices with ALD high-k dielectrics
198. Defects and bonding configurations in high-k/silicon and high-k/gallium arsenide gate structures
199. Electron tunneling spectroscopy of silicon metal-oxide-semiconductor system with various high-k gate dielectrics
200. An active phase shifter using a tunable high-k capacitor
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