The Structure,Transmission,Reflection And Electrical Properties Of (Mo/AZO)_N Compositionally Modulated Multilayers Films

The aluminum-doped zinc oxide（AZO）thin film has a high resistivity.Metal interlayer treatment of AZO films can reduce resistivity.In this paper,（Mo/AZO）_N compositionally modulated multilayer films and（Al/AZO）_N compositionally modulated multilayer films were prepared on glass substrates by stacking AZO layers with metallic Mo and Al layers using radio frequency and unipolar medium frequency pulsed direct current magnetron sputtering technology to obtain comprehensive performance,and The comprehensive performance of the multilayer films was optimized by controlling modulation period,substrate temperature,total thickness of metal layers,and metal type.（1）Controlling the substrate temperature and the total thickness of Mo layer（D=5 nm）constant.The transmittance gradually increases with the increase of the modulation cycles number up to 78.6%,and the resistivity gradually increases at lower substrate temperatures（RT and 100°C）and decreases and then increases at higher substrate temperatures（200°C and 300°C）,and the（Mo/AZO）₃ films prepared at 300°C have the lowest resistivity of 8.636×10^-4Ω·cm.（2）Controlling the number of modulation cycles and the total thickness of Mo layer（D=5 nm）constant.The transmittance gradually increases with the increase of substrate temperature,and the higher the number of modulation cycles,the greater the increase of transmittance,up to 78.6%,and the resistivity gradually decrease at the lower number of modulation cycles（N=1,2,3,4）,with the lowest resistivity of 8.636×10^-4Ω·cm,and decreases and then increases at the higher number of modulation cycles（N=5,6,9）,with the turnaround temperature at 200°C.（3）Controlling the number of modulation cycles and the substrate temperature（300°C）constant.The surface roughness of the films tend to decrease with the decreases of the total thickness of Mo layer,and the lowest surface roughness is 2.09 nm,the resistivity gradually increases and the transmittance tend to increase,but when the total thickness of Mo layer is 2 nm and the number of modulation cycles is high,the transmittance of the films fluctuate above and below 86%,and the（Mo/AZO）₄ films with the total thickness of Mo layer of 2 nm have the highest transmittance（87.2%）.（4）The difference between（Al/AZO）_N compositionally modulated multilayer films and（Mo/AZO）_N compositionally modulated multilayer films was investigated using Al as the metal layer.The results show that the（Al/AZO）_N compositionally modulated multilayer films has the maximum light transmission of 92.2%,the lowest resistivity of2.046×10^-3Ω·cm,and the best quality factor of 2.05×10^-3Ω^-1.Comparing with the（Mo/AZO）_N compositionally modulated multilayer films,the optical performance is better,but the resistivity is large.