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Fabrication And Application Of Nanoparticle Array Based On Dip Pen Nanolithography

Posted on:2023-09-11Degree:MasterType:Thesis
Country:ChinaCandidate:Z Q LiFull Text:PDF
GTID:2531307097479954Subject:Chemistry
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Nanomaterials have been widely applied to many fields such as greenhouse gases elimination and hydrogen fuel cells.The properties of these nanomaterials depend on parameters such as their composition,size,shape and structure.At present,there are a large number of methods for adjusting the parameters of nanomaterials and controlling their synthesis,including co-reduction,thermal decomposition,seed-mediated growth,electrochemical displacement,scanning probe lithography(SPL),but these methods both have limitations for the synthesis of nanomaterials.For example,the traditional solution phase synthesis method is easy to cause problems such as particle inhomogeneity and agglomeration.In addition,the synthesis conditions of different materials are completely different,which greatly increases the difficulty of synthesizing multi-type nanomaterials.More importantly,synthesis methods based on the solution phase often require a layer of stabilizer on the surface of the material to obtain a stable presence of nanoparticles,the presence of these stabilizers to a certain extent masks the intrinsic activity of nanoparticles;at the same time,the nanoparticles synthesized in the solution phase are very prone to agglomeration when they are transferred to the research substrate.Therefore,it is difficult for researchers to successfully reveal the intrinsic activity and structure-activity relationship of nanoparticles.Traditional lithography or chemical etching methods can modify a specific substrate surface to obtain mono-dispersed and uniform size nanomaterials.But its processing principle is to destroy the substrate surface,so its preparation process often requires relatively extreme conditions.In addition,due to the limited choice of substrate,traditional lithography or chemical etching methods are difficult to achieve diversity in the types of synthetic materials,especially for multi-metallic nanoparticles.This article introduces a new SPL technology,the dip-pen nanolithography(DPN),which transmits"ink"to the substrate through the tip of an atomic force microscope(AFM)dipped in"ink"or a polymer tip to achieve printing.This technology can print individual nanoparticles at the desired location,overcoming the limitations of traditional solution phase synthesis methods and traditional lithography methods.In addition,the technology also has the advantages of high throughput,high resolution,and can be patterned on the developed commercial instruments.Therefore,this technology has great application prospects in the field of nanomaterial synthesis and nanofabrication.In this paper,based on DPN,we have realized the controlled synthesis and application of new multi-metallic nanoparticles and Al2O3 nanoparticles.The chapter 1 of the paper summarizes the synthesis and design strategies of nanoparticles in the past few decades,and then focuses on the development of DPN,printing methods of various materials by DPN,and the synthesis and application of functional nanomaterials based on DPN.In the chapter 2,we prepared a series of metal-based peroxide nanozymes based on the DPN,which is used as a reliable experimental platform for studying the intrinsic activity of nanozymes.In the chapter 3,we synthesized an array of alumina nanoparticles based on DPN,combined with wet transfer of two-dimensional materials,and applied to the strain-regulated the activity of Mo S2 for hydrogen evolution.
Keywords/Search Tags:Dip-pen Nanolithography, Multi-metallic Nanoparticles, Peroxidase, Alumina Nanoparticles, Strain Engineering
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