Mechanism And Experiment Research On Fabrication Of Large Depth Nanopattern With Rotational Near Field Lithography

The widely use of large scale integrated circuit drives the fast development of nanofabrication technology,but the contradiction between resolution,efficiency and cost has made many modern nanofabrication technology unable to be widely used.The rotational near field lithography is a promising nanofabrication technology.But the exponential decay in perpendicular direction as the distance increase made the image of surface plasmonic lens inside photoresist has a low elongated depth and contrast,thus,the nano-pattern fabricated by rotational near field lithography has a low depth and steepness.This thesis introduces the investigation on the propagation properties of surface plasmon in multi-layers of dielectric,and a surface plasmonic lens fit for rotational near field lithography is designed and fabricated.The feasibility of large depth nanopattern fabricated by rotational near field lithography is tested by the prototype system built on the head disk flying tester.Firstly,based on matrix transfer theory,the dispersion equation of surface plasmons propagating in multi-layers is established,and the propagation properties of surface plasmons was investigate by the dispersion equation.Thus,the relationship between the resonance wavelength of surface plasmons and film thickness is established.A surface plasmonic lens focusing an ideal spot inside photoresist illuminated by linearly polarized355 nm laser beams is designed,and fabricated by focused ion beam.Secondly,a reflective surface plasmonic rotational near field lithography is proposed and investigated for its improvement of imaging contrast and elongated depth inside photoresist layer.Lastly,the rotational near field lithography system was built based on the head disk flying tester,lithography head flying stablely on the photoresist disk by taking off on “flying transition zone”,and exposing the photoresist,to test the feasibility of the fabrication of nano-pattern with high aspect ratio and high resolution.