Preparation And Properties Of TiAlSiN Nanocomposite Films And TiN/TiAlSiN Modulated Multilayer Films By Magnetron Sputtering

With the development of science and technology,the traditional cutting tools can not meet the requirements of industrial processing.Currently,The nitride films has become a hot spot because of the high micro-hardness and high temperature resistance.Although TiAlSiN film has excellent properties,the low adhesion strength is a bottleneck for its practical application.The purpose of this paper is to find the optimum process parameters of TiAlSiN films to improve the adhesion strength,making TiAlSiN films actually applied to the cutting tool to improve the life of cutting tools and cutting precision.In this paper,a series of TiAlSiN single layer films,TiAlSiN gradient films and TiN/TiAlSiN multi-layer modulation films were prepared on stainless steel 304L by magnetron sputtering.The effect of nitrogen flow rate,substrate temperature,deposition time and sputtering power on TiAlSiN monolayer films,and the effect of gradient time on TiAlSiN gradient films and modulation ratio on TiN/TiAlSiN multilayer film were studied respectively.The main means of characterization include phase analysis,SEM,TEM,films adhesion automatic scratch tester,microhardness tester.The results are:(1)The optimum process parameters of TiAlSiN single-layer film prepared by magnetron sputtering are as follows:the flow rate of nitrogen is increased to 8 sccm,the substrate temperature is 300?,the deposition time is 120 min and the sputtering power is 600 W.The XRD pattern of the film obtained by the process showed a Face-centered cubic structure similar as TiN films,without any Sicontaining phase.The thin film obtained small size and high density with these parameters,microhardness reches 3791 HV and the adhension strength is 42 N.High-resolution transmission analysis shows that the Si3N4 phase is coated with(Ti,Al)N phase and has a grain size of 10-15 nm.(2)The TiAlSiN gradient films are prepared by changing the gradient time.The results show that the microhardness is 3824 HV and the adhesion strength is 48 N.Slightly better than monolayer film.On this basis,the TiN-TiAlSiN gradient films are prepared,and get the conclusion that the adhesion strength reaches 62 N when the TiN film is gradient film.(3)TiN/TiAlSiN multilayered films are prepared on the basis of monolayer films and gradient films,and studying the different modulation ratio have influence on the microstructure,structure and mechanical properties.It is found that the different modulation ratio have little effect on the XRD patterns and the morphology of the films.However,when the modulation ratio changes from 1:1 to 1:4,the microhardness increases from 2945 HV to 3276 HV.Adhesion strength reduces from 70 N to 51 N.