Fabrication Technology Of Image Transmission Panel Based On Silicon Microchannel Array

Based on the image transmission principle of optical fiber panel,a new method of fabricating image transmission panel is proposed in this paper.Silicon microchannel arrays were fabricated by photo-assisted electrochemical method and used as the skeleton structure of the image transmission panel.A silicon dioxide layer is prepared on the inner wall of the channel by an oxidation process to be used as a cladding,and high refractive index glass is filled in the inner wall of the channel to be used as a core material to prepare the image transmission device with a new structure.The image transmission panel based on the silicon micro-channel array can have higher resolution because the image transmission panel is not influenced by transverse dispersion of light.The image transmission principle of optical fiber panel is studied,and the influence of the geometric size of monofilament core and cladding on the resolution and filling rate of the traditional optical fiber image transmission device is analyzed.The influence of the period and aperture on the fill factor and resolution of the image transmission panel based on silicon micro-channel array is studied,and compared with the traditional optical fiber panel.The results show that the filling rate of the image transmission panel based on silicon micro-channel array is higher than that of the traditional optical fiber panel when the width of the monofilament and the thickness of the absorption layer are the same;When the wire diameter is the same,there is little difference between the two resolutions.The influence of refractive index of core material on numerical aperture was studied,and the related parameters of glass material were investigated.According to the numerical aperture formula,P-SF68 glass was selected as the core material.The effects of the parameters on the experimental results of the photo-assisted electrochemical fabrication of silicon microchannel arrays were studied.The results show that when the concentration of HF in the electrolyte is high or low,it has adverse effects on the experiment.If the concentration of HF in the electrolyte is too high,it is easy to corrode,and if the concentration of HF in the electrolyte is too low,the corrosion rate is too slow.By analyzing the experimental phenomena,4wt%HF was selected as the electrolyte for photo-assisted electrochemical fabrication of silicon microchannel arrays.The effect of electrolyte containing different surfactants on photo-assisted electrochemistry was studied.The results show that the corrosion rate is different by using different kinds of surfactants,cationic surfactants will accelerate the corrosion rate,and anionic surfactants will reduce the corrosion rate.The effect of spectral response on photo-assisted electrochemistry is studied.The spectral response increases with wavelength.The fundamental reason is that as the wavelength of light increases,the penetration depth of light in silicon also increases.According to the research results,suitable experimental conditions were selected to prepare a silicon microchannel array with a period of 10?m and a length of 200?m.The shaping process of silicon microchannel array was studied,and the influence of TMAH concentration and temperature on the ratio of opening area in the shaping of silicon microchannel array was analyzed.Studies have shown that when the ratio of(100)crystal orientation corrosion rate V₍₁₀₀₎to(110)crystal orientation corrosion rate V₍₁₁₀₎>?2,a silicon microchannel array with a square opening shape can be obtained.At this time,the opening ratio can be achieved.maximum.After etching,a silicon microchannel array with an opening area ratio greater than 80%and a wall thickness less than 1?m is prepared.The effect of the oxidation time of the silicon microchannel array on the thickness of the oxide layer was studied,and a 4 h dry oxygen oxidation was used to finally prepare a silicon dioxide layer with a thickness of 325 nm.The filling principle of silicon microchannel arrays was analyzed,and the influence of temperature on the filling rate,the influence of temperature on glass crystallization and the influence of cooling rate on microcracks were studied.Studies have shown that:the temperature is increased from room temperature(23°C)to 800°C in 2h,the constant temperature is 4h,and the cooling rate is 6°C/h,the P-SF68 glass can be completely filled into the microchannel array.A test platform was built to test the performance of the prepared optical fiber panel samples.The resolution and air tightness of the prepared fiber panel samples were measured.The resolution test was carried out with a standard US military standard identification rate board,and the results showed that the resolution of the prepared optical fiber panel sample can reach 57 lp/mm.Pfeiffer ASM 340 leak detector was used to test the airtightness of the prepared sample by the helium cover method.The leak rate of the sample is 4.2×10^-7Pa·m³/s.