Study On Uniformity Of Atmospheric Plasma Microjets Array And Its Application

Atmospheric pressure plasma microjet is a kind of plasma generated in an open space under atmospheric pressure,and the size of jet is less than 1 mm.It has the advantages of not requiring a vacuum chamber,remote processing at room temperature,and small size.It can be used for 3D maskless micro-patterning of materials,and has broad application prospects in the fields of micro-electromechanical systems and micro/nano biomedicine.The material can only be treated in a single channel by a single plasma jet.In order to improve efficiency,multiple micro-jets can be combined to form a plasma microjets array for parallel processing.However,the jet-to-jet distance of the microjets array is usually at the scale of millimeters,which limits its application in the micrometer scale.Therefore,we propose a new atmospheric pressure plasma microjets array(P?JA)device,which combines atmospheric pressure plasma jets and micronozzle arrays prepared by micromachining processes to achieve a jet size and spacing in the micron range.Due to the interaction between the multiple jets in the array,there is non-uniformity among the P?JA,which will greatly affect the uniformity of the material processing.Therefore,this paper mainly studies the influencing factors of the microjet uniformity in P?JA,and analyzes the influence of the working voltage,gas flow rate and jet-to-jet distance on the uniformity of the microjet array through simulation and experiment.At the same time,the influence of the microjets array on the uniformity of photoresist etching under different applied voltage and gas flow rate is studied.On this basis,we successfully used the microjets array for the maskless micropatterning etching of the interdigitated graphene electrodes of flexible microsupercapacitors.It provides a low-cost,high-efficiency,simple and flexible new method for the processing and preparation of micro-supercapacitors.Based on the above background,the main research contents of this article are as follows:1.Based on the microjets array proposed by our group,the equivalent electrical model and equivalent circuit of the P?JA discharge process are established.Simulink software is used to dynamically simulate the electrical characteristics of the microjets,and the voltage and current characteristics and discharge power are studied.In-depth understanding of the electrical process and discharge mechanism of this structure.2.The effects of applied voltage,gas flow rate and jet-to-jet distance on the uniformity of the microjet array are studied,the Lissajous figure and discharge power under different parameters are measured,and the mechanism of the effect of different operating parameters on the uniformity of the jet is discussed.3.Through the etching experiment of P?JA on the photoresist film,the influence of the discharge voltage and gas flow rate of the microjets array on the uniformity of the film etching is studied.By measuring the emission spectra under different parameters,the influence mechanism of the parameters on the etching uniformity is explained4.Plasma microjet is used to etch interdigital electrodes with different electrode widths on the graphene film,and the flexible micro-supercapacitors are packaged to test their electrochemical performance.At the same time,the interdigital electrode array is efficiently prepared by P?JA parallel maskless etching,and the series and parallel connection of micro supercapacitors are realized.