| The object of this thesis is to build an autonomous control system able to control the deposition process of multi-layered thin films in a high vacuum chamber. Two types of depositions will be possible, either by thermal evaporation or by sputtering. During the deposition process, the system will do the data acquisition of all the controllable parameters and at the same time, will make sure that the target deposition rate, the target temperature of the specimen as well as the target flow rates of the gases are followed during the entire deposition process. Also, during the deposition process, all the data retrieved will be presented to the user in the form of a graph and following the deposition process the user will be able to save the data in a file format. In addition, we will perform numerous tests in order to validate and improve the performance and the functionality of the system. |
