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Development of microfabricated micro-well structures using SU-8 (50) negative photoresist

Posted on:2003-03-04Degree:M.SType:Thesis
University:University of LouisvilleCandidate:Shinde, Harshavardhan ChandramohanFull Text:PDF
GTID:2461390011480488Subject:Engineering
Abstract/Summary:
The fabrication of Microwell structures has been developed to be used as a genosensor at the Oakridge National Laboratories to carry out processes such as DNA Hybridization. The basic structure consists of four well sizes namely; 50μm, 150μm, 350μm and 750μm with street-width and sidewall thicknesses being 50μm each. The wells are developed on channel glass, which has through holes of 10μm diameter. These holes are the region where the general process of the hybridization will be carried out. The four well sizes give a very broad spectrum to work with and offer ease of operation in each case. Multiple well structures have been fabricated and in each case providing constant height to the walls and streetwidths. The design to develop these wells required only a single photomask.
Keywords/Search Tags:Structures
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