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Surface characterization of 3-glycidoxypropyltrimethoxysilane films on silicon-based substrates

Posted on:2005-02-10Degree:M.ScType:Thesis
University:University of Toronto (Canada)Candidate:Wong, April Ka YeeFull Text:PDF
GTID:2451390011950927Subject:Chemistry
Abstract/Summary:
This work involved the characterization of covalently-attached 3-glycidoxypropyltrimethoxysilane (GOPS) on silicon-based substrates such as silicon wafers and glass for the development of optical DNA biosensors. Surface-sensitive techniques including angularly-dependent X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS), atomic force microscopy (AFM), scanning electron microscopy (SEM), and single-wavelength and spectroscopic ellipsometry were used to determine surface morphology, film thickness, and chemical composition. XPS and ToF-SIMS provided chemical evidence of GOPS and indicated a uniform spatial distribution of GOPS. AFM and SEM data suggested the presence of a film that consisted of nodules. Angularly-resolved XPS and both ellipsometry techniques produced thickness values of the GOPS film indicative of a monolayer film. Based on these results, the GOPS film was characterized to be a uniform monolayer with nodules. It is speculated that these nodules may provide insight into the behaviour of DNA hybridization kinetics and thermodynamics on GOPS-derivatized silicon-based substrates.
Keywords/Search Tags:GOPS, Silicon-based, Film
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