Surface deposition and encapsulation of metallic clusters

In this work metallic clusters are produced by both encapsulation in an aerogel matrix and deposition on a surface. Entrapment of metal clusters inside aerogels is accomplished though synthesis of a hydrogel precursor, washing it with an aqueous metal salt solution, and controlled reduction of the metal. Although the aerogel matrix stabilizes and prevents subsequent loss or aggregation of the clusters once they are produced, controlling the rate of reduction is key to the size and morphology of the clusters. In order to do this, both radiolytic and chemical reduction methods are used.; The radiolytic technique for the formation of metal cluster aerogel composites utilizes gamma radiation to reduce the solution of Ag+ or [AuCl 4]- ions inside of the hydrogel precursor. After exposure to gamma rays, the previously colorless gels have the coloration typical of colloids of Au (pink) and Ag (yellow/brown) clusters. Typical gamma doses are between 2 to 3.5 kGy for hydrogels containing 10-4 to 10-3 mol·L-1 metal solutions. Subsequent characterization confirmed the presence of metal clusters with a fcc structure. The cluster diameters varied between 10 and 200nm, depending on the synthesis parameters.; More conventional chemical reduction is also employed in this work to produce noble metal clusters in an aerogel matrix. Hydrogels were washed in a basic solution of Ag+ or [AuCl4]- ions, and formaldehyde was added to the solution. The reduction proceeded relatively slowly, allowing the formaldehyde to diffuse into the hydrogel before complete reduction took place. This procedure was also used to produce alloys of gold and silver clusters embedded in silica aerogels.; Also included in this dissertation is the surface deposition of metallic clusters on a silicon surface. The apparatus built produces a cold beam of gas droplets that pick up evaporated metal clusters and deposit them on a surface. The gas clusters are produced by supersonic expansion of a gas (Ar, He, or N2) through a nozzle. The gas then passes through a metal evaporator stage with indium and finally, the cluster beam strikes a silicon surface depositing the indium. Details of the experimental apparatus and preliminary results are presented.