Characterization of the electronic structure of silicon nanoparticles using x-ray absorption and emission |
| Posted on:2009-04-19 | Degree:Ph.D | Type:Thesis |
| University:University of California, Davis | Candidate:Montoya Vaverka, April Susan | Full Text:PDF |
| GTID:2441390002991607 | Subject:Engineering |
| Abstract/Summary: | PDF Full Text Request |
| Resolving open questions regarding transport in nanostructures can have a huge impact on a broad range of future technologies such as light harvesting for energy. Silicon has potential to be used in many of these applications. Understanding how the band edges of nanostructures move as a function of size, surface termination and assembly is of fundamental importance in understanding the transport properties of these materials. In this thesis work I have investigated the change in the electronic structure of silicon nanoparticle assemblies as the surface termination is changed. Nanoparticles are synthesized using a thermal evaporation technique and sizes are determined using atomic force microscopy (AFM). By passivating the particles with molecules containing alcohol groups we are able to modify the size dependent band edge shifts. Both the valence and conduction bands are measured using synchrotron based x-ray absorption spectroscopy (XAS) and soft x-ray fluorescence (SXF) techniques. Particles synthesized via recrystallization of amorphous silicon/SiO2 multilayers of thicknesses below 10 rim are also investigated using the synchrotron techniques. These samples also show quantum confinement effects but the electronic structure is different from those synthesized via evaporation methods. The total bandgap is determined for all samples measured. The origins of these differences in the electronic structures are discussed. |
| Keywords/Search Tags: | Electronic structure, Using, Silicon, X-ray |
PDF Full Text Request |
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