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Effect Of Doping On The Performance Of Gallium Oxide Ultraviolet Photodetector

Posted on:2020-06-10Degree:MasterType:Thesis
Country:ChinaCandidate:S HouFull Text:PDF
GTID:2428330596476242Subject:Electronic materials and components
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Gallium oxide?Ga2O3?,as a wide bandgap semiconductor material,has attracted wide attention of researchers due to its large band gap?4.9 eV?and stable physicochemical properties.In recent years,gallium oxide has been widely used in various device applications,such as solar blind UV detection,gas detection and power devices.Metal-semiconductor-metal?MSM?structures are widely used in solar blind UV photodetector?PD?due to their large light-receiving area and simple preparation process.However,there are still great challenges in preparing Ga2O3-based solar blind UV detectors which has high-response and high-sensitivity.In this work,two methods were used to prepare high-performance Ga2O3-based solar-blind UV PD.First,Sn-doped Ga2O3 thin film was used to improve responsivity of the PD.Second,(InxGa1-x)2O3 based sandwich structure UV photodetector was fabricated to improve sensitivity and specific detectivity of solar-blind PD.The details are as follows:?1?This paper studied the effect of substrate temperature on Sn-doped gallium oxide thin films.Results show substrate temperature of 560°C is an optimized epitaxial growth parameter for Sn-doped Ga2O3.Photocurrent and dark current of the solar blind UV detector prepared at a substrate temperature of 560°C were much larger than those films grown at higher temperature.On this basis,this paper studied the effect of Sn source temperature on performance of Sn doped Ga2O3 solar-blind PD.Sn-doped epitaxial film were grown at a substrate temperature of 560°C and Sn source temperature of 750,850,and 900°C,respectively.Results show that the photocurrent and dark currents of the Sn-doped Ga2O3 solar ultraviolet PDs increased with increasing Sn source temperature.This is mainly due to the increase of the carrier concentration by Sn doping,which lowers the resistivity of the film,thereby greatly increasing the responsivity of the device.However,as the temperature of Sn source raised to 1000 and1100°C,the crystal quality of the gallium oxide film were gradually deteriorated,and photocurrent,dark current and responsivity of the device gradually decreased.These result indicate excessive temperature of Sn cause the deteriorates of crystal quality,resulting in deterioration of the performance of the PDs.Above all,films with substrate temperature of 560?and Sn source of 900?exhibits the highest responsivity of444.51 A/W,indicating Sn doping can effectively improve the performance of Ga2O3PDs.?2?In this paper,a Ga2O3-(InxGa1-x)2O3-Ga2O3 sandwich structure solar-blind PD was developed.Since In can adjust the band gap of Ga2O3,and increase the mobility of the film,(InxGa1-x)2O3 is very suitable for the preparation of high-performance PDs.Results show that with the increase of the thickness of the top Ga2O3 layer,the dark current of the sandwich structure PD was significantly reduced,which greatly increased the special detictivity and sensitivity of the device.The reduction of dark current is attribute to the introduction of top Ga2O3 layer which changes the contact characteristics between metal and(InxGa1-x)2O3 film,which optimized device performance.The specific detectivity of PD with 15 nm top Ga2O3 layer is 3.06×1013 cm·Hz1/2/W,which increased by an order of magnitude than that of Ga2O3-(InxGa1-x)2O3 structure,indicating that(InxGa1-x)2O3 sandwich structure can optimize the photocurrent and dark current of the solar blind UV PD and improve the specific detectivity of the device,thus improving the performance of the solar-blind PD.
Keywords/Search Tags:?-Ga2O3, Molecular beam epitaxy, Ga2O3-(InxGa1-x)2O3-Ga2O3, Sn doping, solar-blind UV photodetector
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