Study On The Leveling Method Of Lithography Platform Based On Linear CCD Adaptive Imaging

Lithography technology is the core of modern electronic information technology,and lithography platform leveling technology is an indispensable part of lithography technology.Using the leveling technology of lithography platform to adjust the lithography platform will help to improve the quality of lithography exposure in the lithography process.At present,the traditional lithography platform leveling technology mainly relies on the lithography leveling based on optical reflection,which requires high requirements for optical design and hardware implementation,and is more vulnerable to interference from the experimental environment.In addition,linear CCD is the commonly used imaging detection equipment,and linear CCD is more vulnerable to speed interference in the experimental process,which affects the accuracy and effect of leveling angle detection.Based on the traditional lithographic leveling technology,a new method of lithographic platform leveling based on linear CCD adaptive imaging is proposed in this paper.The main research contents are as follows:1)Based on the fact that linear CCD imaging is easily disturbed by the disturbance of scanning speed,an adaptive imaging method of linear CCD is designed in this paper,which makes the anti-jamming ability of linear CCD scanning imaging stronger,and thus enhances the ability of the square adjustment method proposed in this paper to adapt to environmental interference.2)In order to simplify the hardware requirement of lithography leveling,a calculation method of tilt angle based on vertical projection imaging is designed on the basis of traditional leveling method of lithography platform based on optical path reflection.Calculating the leveling angle based on linear CCD imaging simplifies the traditional calculation process of the leveling angle.3)Using raL8192-12 gm linear array camera,C++ and C# and other software development environments,this paper realizes the leveling method of lithography platform based on linear CCD adaptive imaging by combining software and hardware.Compared with the traditional lithography leveling method,the proposed method simplifies the traditional lithography platform leveling hardware equipment and the calculation process of leveling angle.A new method based on vertical projection isadopted,which uses linear CCD for vertical projection imaging to calculate the lithography platform tilt angle.The possible velocity disturbance in the process of linear CCD imaging is also discussed.In-depth analysis and treatment.Experiments show that,compared with the traditional lithographic machine leveling method,it has the advantages of low hardware cost,flexible testing method and adaptability to speed interference in imaging.