The Control Logic Design Of The EUVL Vacuum Experimental Platform

Extreme Ultraviolet Lithography is the most promising next-generation lithography,and plays an important role in the field of the ic technology,while the clean technology of contamination of optical surface is one of the key technologies to be solved as well as increasing the transmission rate of silicon wafers.In view of this,the research on Extreme Ultraviolet Lithography is still in the initial stage in China.In this thesis,the EUVL vacuum laboratory platform is used as research object.This paper designs the control system of the laboratory platform.The main work and results are as follows:The requirements of the control system on the base of the requirements and infrastructure of the EUVL vacuum laboratory platform are analyzed.Then,plan control scheme by the requirements of vacuum pumping,wafer transmission,troubleshooting and HCI.Finally I choose the control way of touch screen and PLC in conformity with the demand of the requirements.PLC acts as a main controller and the touch screen is employed for man-computer interaction to help each chamber to accomplish automatically vacuuming and transmission of the wafer.After selections of control hardware,draw the electrical schematic diagram.To improve the transmission rate of silicon wafers,I use two LL chambers and the atmospheric manipulator which can transmit two wafers simultaneously.Because of the wafer transmission sequence is the main influencing factor of the transmission rate,I propose two schemes.And I design and analysis the scheme and timing of the silicon wafer transmission.Eventually the transmission rate of silicon wafers is greater than 125 per hour.The system software adopts modularity program design technique.Based on the modularity program design method,the control system can decompose for 7 simple modules.For the normal logical design of the system,finite-state machine(FSM)is used to express the each module internal actions.For abnormal logic design,I use two types of fault detection.The two types are fault scanning function block and each action slave module.The experiment platform can lay a foundation for the development of EUV lithography.