| TaN film has the advantages of high hardness and high thermal stability,so it has broad application prospects in the field of tool coating,and its high resistivity makes it widely used as a thin film resistor and diffusion barrier in electronic devices.However,the TaN phase structure is numerous,resulting in a very different performance in a certain application field.In this paper,the phase structure and orientation of TaN films were controlled by pulsed reactive magnetron sputtering.The effects of phase structure and orientation on the resistivity and tribological properties of TaN films were investigated.The concrete research content is as follows:The phase structure and preferred orientation of?-TaN and?-TaN films were controlled by designing and regulating the parameters of magnetron sputtering process.As the sputtering power and film thickness increase,a single TaN phase was converted into a mixed phase of?-TaN and?-TaN??-TaN+?-TaN?.The proper surface energy and strain energy synergistically induced the formation of?-TaN films of different orientations.Increasing the incident particle flow and energy tend s to produce a?200?crystal plane with a low surface energy,conversely,a?111?crystal plane was generated.The phase structure and orientation greatly affect the sheet resistivity.?-TaN?200?film resistivity?1005000??·cm?was lower than?-TaN?111?film?10055000??·cm?which?-TaN?111?oriented film was easy to form non-dense structure.The?-TaN film had a lower resistivity than the?-TaN film.The result of XPS indicates that the?-TaN phase exhibited more metallic.The mixed phase film has the lowest resistivity,and the mixed phase can reduce the defect density and increase the carrier transport rate.It is expected to be used as a thin film resistor material,and lay a foundation for studying the electrical properties of the wide temperature domain of TaN film in the future.The dense columnar crystal structure of?-TaN?200?film and WC-Co cemented carbide have a critical failure load of 80N,and have good toughness and high hardness?30 GPa?and low surface energy.Thus,it possessed excellent wear resistance.Its wear rate was as low as 2.4×10-6 mm3/N·m which is better than the commonly used TiCN film(3.7×10-6 mm3/N·m).The pore structure resulted in a low hardness?11.5 GPa?of the?-TaN?111?film and a poor a critical failure load of 30 N,and the wear resistance is greatly reduced.Isometric crystal?-TaN?111?+?200?film??-TaN mixed orientation?with high hardness?36.5 GPa?and high a critical failure load of 80N,but its toughness is poor which contributed to an abrasion resistance(2.8×10-6 mm3/N·m)which is inferior to that of?-TaN?200?film.The study indicate that the?-TaN?200?oriented film is expected to be used as a tool coating in the future. |
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