| AMA is the solar spectrum selective film that has the ideal photothermal conversion property in the vacuum environment with the simple structure and good thermal stability.But if it is directly used solar-power thermal collector selective absorption coating materials under the working conditions of atmospheric environment with the medium-high temperature(T?500?),there are the issues such as the entire thickness is thin,thermal oxidation resistance is insufficient and solar-thermal absorbing performance is reduced etc.However,it is expected to solve these issues by developing the multi-level interfered stack-based gradient structure AMA photo-thermal film with the gradient variation in the middle semi-transparent(M)layer and the dielectric layer dimension is gradually increased from the infrared reflection basement layer to the upward.Therefore,this project raises the concept of AMAMA...multi-layer stack,as well as respectively takes two kinds of reaction sputtering level control technologies e.g.relative strength of plasma radiation(PEM)and Ar/O2 flow ratio so as to perform the experimental research and process design to two film materials MoNx or MoOx as the middle semi-transparent layer of multi-level interfered stack-based gradient AMA film.Afterwards it is based on the traditional secondary level interfered sandwich structure of AMA solar spectrum film to design and manufacture the third-level and fourth-level interfered stack-based AMA photo-thermal film under the condition of optimizing the conditions for dimensional parameters of second-level thin dielectric layers.It has compared to research the effects and influential rules from the different matching of middle semi-transparent layers to the solar-thermal absorbing performance of AMA multi-level film.It has finally performed the thermal oxidation treatment of 8h insulation to the manufactured third-level and fourth-level AMA photo-thermal films respectively at the temperature of 500?,550? and 600?,performed the testing analysis to optic property,sectional morphology,phase composition and film-substrate adhesion property etc.of film before and after the thermal oxidation treatment,as well as evaluated the service reliability improvement degree for the multi-level interfered stack-based gradient AMA film under the medium-high temperature atmospheric environment.The research results indicate:It is able to realize the material production of middle semi-transparent lay film with the variable extinction coefficient and adjustable component by applying the production technology of incomplete reaction sputtering technology;MoOx film produced by applying Ar/O2 flow ratio incomplete reaction sputtering degree-control technology more complies with the design requirements of M layer in the multi-level interfered stack-based mechanism AMA photo-thermal film.Under the conditions that the sputtering power is 100W and the air pressure is 1Pa,it is able to precisely control to the film dimension of 20nm level.The error between theoretical design and practical film thickness is less than 5%.The best dimensional matching for each functional layer of second-lever interfered AMA photo-thermal film is 80/32/20/64nm,in which FST is the pure Mo layer and its absorbing ratio is as high as 94.21%;When the best dimensional matching for each functional layer IR/FD/FST/SD/SST/AR of third-level interfered AMA film is 80/32/20/64/10/64nm,it is able to determine as the configuration with the best as-deposited selective absorbing quality,and the absorbing ratio is as high as 94.43%on average,in which the absorbing ratio is the highest when SST layer adopts MoOx film with the Ar/O2 flow ratio is 44/1,and the absorbing ratio is as high as 94.71%;The best dimensional matching for each functional layer IR/FD/FST/SD/SST/TD/FST/AR of fourth-level interfered AMA film is 80/32/20/64/10/64/10/64nm,in which the absorbing quality is the best when FST,SST,FST layers adopt the pure Mo component,and the absorbing ratio is as high as 93.27%.The third-level interfered AMA photo-thermal film can keep the good structural completeness after the 8-hour thermal oxidation treatment at the temperature of 500? and 550?with no obvious change in component.The absorbing ratio will maintain above 90%after the 8-hour thermal oxidation treatment at the temperature of 500?,and the film-substrate bonding level is slightly degenerated to HF4 level,which can be stably used under the working condition of 500-550?;The overall thickness of fourth-level interfered AMA film is increased by 148nm compared with the second-level interfered film,which can still maintain the absorbing ratio of 86.8%after the thermal oxidation treatment at the temperature of 600?.But the film-substrate bonding level will be degenerated to HF5 level,which indicates that the service temperature under the atmospheric environment can be increased to 600?,but the brittleness tendency of film is significant and the optical property has a obvious degeneration.The above results have proved that the multi-level interfered stack-based optical structure design raised by this paper and the incomplete reaction sputtering technology for variable component Mo metal ceramic middle semi-transparent layer establish here can significantly improve their overall thickness and medium-high temperature thermal oxidation stability based on realizing the multi-polarization and gradient of structural component for AMA film interfered level,which can be taken as one usage technology solution for resolving the technical bottleneck of insufficient oxidation resistance faced by AMA film is used for the solar power in the medium-high temperature atmospheric environment. |
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