Effect Of Doping And Heat Treatment On The Photocatalytic Performance Of Nano-TiO₂ Films Prepared By Magnetron Sputtering

TiO₂ is a semiconductor material with high physical and chemical stability,high photocatalytic ability,self-cleaning ability,sterilization ability,and other excellent properties,and it has been more and more widely used in environmental protection,building materials,and other industries.TiO₂ can completely decompose most macromolecular organic pollutants under the excitation of ultraviolet light energy until it is decomposed into small molecular inorganic substances such as water and carbon dioxide which are harmless to the environment and human body,so as to achieve the degradation of organic pollutants in the environment and protection,the purpose of the environment and reducing pollution.People have high expectations for the wide application of semiconductor TiO₂ photocatalytic materials in life.However,the structure of TiO₂ itself has a wide optical band gap,so that it can only have photocatalytic degradation ability under the excitation of high-energy ultraviolet light,and there is no way to use the visible light that accounts for most of the sunlight.The common industrially prepared titanium dioxide P25 also exists in a powder state that is easy to agglomerate and precipitate in water,which affects light absorption and recovery is difficult.It may cause secondary pollution to the environment,so these problems also limit the wide range of TiO₂ in production and life application.In order to solve the above common problems,this paper uses magnetron sputtering method to deposit TiO₂ film on the glass slide,and enter the TiO₂ film by doping different substances to achieve the purpose of improving the photocatalytic performance of the TiO₂ film.This article briefly introduces the research status,research significance,various preparation methods of TiO₂ materials,comprehensively compares and analyzes various methods of preparing TiO₂ photocatalytic materials,chooses to use the magnetron sputtering coating method to prepare TiO₂ thin films,and based on Based on the previous research of the research group,the pure TiO₂ film prepared by the coating was doped and improved to improve the photocatalytic performance of nano-TiO₂ material under ultraviolet light.In this paper,the TiO₂ thin film co-doped with metallic Cr and non-metallic C was prepared,keeping other parameter values unchanged.By changing the DC sputtering power of the Cr target,the Cr and C co-doped nano-TiO₂ thin film Cr was studied The optimal doping amount is RF sputtering C100w,DC sputtering Cr20w,and through the research on the heat treatment temperature of Cr and C thin films under the optimal doping amount,the optimal Cr and C co-doped thin films are determined.The heat treatment temperature is a muffle furnace temperature of 550°C.After 1 hour of light,about 24.69%of rhodamine B solution was degraded.TiO₂ semiconductor thin film doped with semiconductor Fe₂O₃ was prepared,keeping other parameters unchanged from the preparation of pure TiO₂,changing the sputtering power of DC sputtering Fe₂O₃ target,and determining the best sputtering power for researching Fe₂O₃ target by experiment After sputtering for 20w,about53.84%of rhodamine B solution was degraded after 1 hour.The optimal heat treatment temperature is about 600℃set in the muffle furnace.The best preparation parameters of Fe₂O₃ single-doped nano-TiO₂ thin film were obtained.The Ni-doped TiO₂ film was studied.The other parameters of the pure TiO₂film were kept unchanged,and the doping amount of different Ni sputtering power was studied.The results showed that the Ni target had the highest photocatalytic efficiency at DC sputtering power of 20w,and degraded 29.54%of Rodin within 1hour.For the Ming B solution,the heat treatment temperature of its muffle furnace was studied and tested,and the optimal heat treatment temperature was 550℃.