| With the problem of noise and damaging vibration,polymer damping materials have been greatly developed.However,it’s difficult for the existing polymer damping materials to simultaneously have wide effective damping temperature(△T),high damping effective and heat resistance.In addition,the traditional heat-curing manufacturing process has the disadvantages of high curing temperature and long time,which does not meet the requirements of modern society for high-efficiency and energy-saving.Therefore,the preparation of photocrosslinkable damping materials with thermally resistance,high loss factor(tanδ)and broad △T has important scientific significance and great practical value.This article aims to research on photo-crosslinked damping materials with high temperature resistance,wide △T and high tand.The research content is mainly divided into the following two parts:Firstly,allyl poly(phenylene oxide)(APPO)was synthesized,then a binary photo-crosslinked film(FAPPO)based on APPO and vinyl fluorosilicone rubber(FSR)was prepared by "thiol-ene" light click reaction,of which the influence and mechanism of the composition on the structure and damping properties were systematically studied.The results show that the binary photocrosslinked films(FAPPO)composed of FSR and APPO have high temperature resistance and broad △T.Typically,1OFAPPO film has the best overall performance with the △Tis 75℃(142～217 C)and the maximum tand is 0.78,of which the mass ratio of FSR and APPO is 1:9.Secondly,a graft copolymer(PSi-g-APPO)of APPO and FSR was synthesized and added to 10FAPPO to prepare a ternary photo-crosslinked film(GFA).The structure and damping properties of GFA and the influence of PSi-g-APPO on the phase structure,damping properties and heat resistance of the films was studied deeply.The results indicate that GFA films have the excellent properties of high temperature resistance,wide △T,and high tanδ.Among them,10GFA of which the weight ratio of APPO:FSR:PSi-g-APPO is 81:9:10 exhibits a broad △T of 64℃ and a high tanδ(up to 1.01)from 157 to 221℃,showing the best comprehensive performance among GFA system.The excellent integrated performances of GFA were attributed to the unique structure of heterogeneous GFA system.Finally,in order to prepare photo-crosslinkable damping materials with higher heat resistance,polyhedral oligomeric silsesquioxane(POSS-SH)containing thiol groups is synthesized.Then a novel series of binary photo-crosslinked films(PFA)composed of APPO and FSR were prepared,with POSS-SH as the cross-linking agent.The damping properties,heat resistance and phase structure of PFA were systematically studied and compared with the overall performance of FAPPO.Meanwhile,the influence of POSS-SH on the structure and properties of photo-crosslinked films was discussed.Results show that POO-SH can improve the compatibility between FSR and APPO;the PFA system has good damping efficiency,and the maximum tanδ is more than 0.7;In addition,the thermally resistance of PFA was significantly higher than that of FAPPO.This is mainly because POSS-SH has excellent thermal stability and high functionality. |
PDF Full Text Request