TiN And Doping/composite Thin Film Preparation And Research

With the increasing global energy problems and people’s awareness of environmental protection,it is extremely urgent to develop new energy-saving and environmentally-friendly materials.As a new building material,low-emission coated glass plays an important role in reducing building energy consumption.In this paper,we studied the influence of deposition temperature on photoelectric properties of TiN film.We prepared Ta-doped TiN films and TiN/Ag/Cu₂O/TiO₂ multilayer composite films and studied their effects on the photoelectric properties of TiN films.The ultimate goal of the study was to obtain low-emission films with good overall performance and to provide theoretical support for expanding the application of TiN-based low-emission film systems.In this paper,TiN film,Ta-doped TiN film and composite film were prepared by magnetron sputtering method with simple equipment,easy control and good repeatability.The effects of deposition temperature,doping and recombination on the photoelectric properties of the films were studied.The specific research contents are as follows:1.Nano-TiN films at different deposition temperatures were prepared by DC reactive magnetron sputtering.The structure and properties of the prepared TiN films were characterized by ellipsometry,X-ray diffractometry,Raman spectroscopy,atomic force microscopy,ultraviolet/visible spectrophotometer and Hall measuring instrument.The results show that as the deposition temperature increases,the grain size of the TiN film increases（from 15.4 nm to 17.4 nm）and the surface roughness increases too.The defects of TiN film are mainly titanium vacancy and nitrogen vacancy.As the deposition temperature increases,the vacancies in the film decrease.The optical properties of the films were measured by ellipsometry.The dielectric and optical properties of the obtained TiN films were analyzed by the Drude-lorentz composite model.The TiN films exhibited typical Drude-lorentz behavior in the visible and near-infrared regions.The test results of Hall measurement and UV/Vis spectrophotometer measurement verify the conclusion that as the deposition temperature increases,the reflectance of the film in the near-infrared region increases.2.The Ta-doped TiN films with different sputtering powers were prepared by dual-target DC magnetron sputtering.The structure and properties of the sample were characterized by ellipsometry,X-ray diffractometry,Raman spectroscopy and UV/Vis spectrophotometer.The results show that with the increase of Ta doping content,the light transmittance of the film increases first and then decreases,and the plasmon resonance point of the film moves toward high energy.When the amount of Ta doping is small,the plasmon resonance point moves relatively small in the high energy direction,so the transmittance of the film in the visible light region is improved.When the amount of Ta doping is large,the metallicity of the film which was caused by the doping of Ta was enhanced.What’s more,the plasmon resonance point moves to a high energy direction which brings a decrease of the transmittance of the film.3.The multilayer composite film TiN/Ag/Cu₂O/TiO₂ was prepared by magnetron sputtering method.The structure and properties of the composite film were characterized by X-ray diffractometer and UV/Vis spectrophotometer.The results show that the prepared multilayer film has a transmittance of 40%in visible light,a reflectance of 95%in the near-ultraviolet region,and a reflectance of 65%in the near-infrared region.The photodegradation characteristics of the multilayer composite membrane were tested by methyl orange solution.The results show that the prepared multilayer composite membrane has good photocatalytic performance.