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The Integrated Design Of The Equipment Of Hot-filament Chemical Vapor Deposition (HFCVD)

Posted on:2018-03-01Degree:MasterType:Thesis
Country:ChinaCandidate:T ZhouFull Text:PDF
GTID:2371330569485115Subject:Mechanical engineering
Abstract/Summary:PDF Full Text Request
Hot filament chemical vapor deposition(HFCVD)method has many advantages such as mature technology,simple equipment and so on,which is one of the most widely used methods for depositing diamond films.This paper mainly studies the development of HFCVD diamond film deposition equipment,designing the support system,cooling system,and pneumatic circuit system of the equipment.In this paper,the theory and application background of HFCVD diamond film are introduced,and the main structure of the film deposition equipment is proposed,including the reaction chamber,support system,cooling system and gas system.Then the support platform is designed as a two-story structure,and its layout plan has also been designed.And the main load-bearing beams of the platform are theoretical checked and combined with the finite element simulation results to verify that the structural strength meets the design requirements.Then the equipment cooling cycle system program is designed and the relevant three-dimensional models are established.The minimum water flow required for the cooling cycle is calculated by hydrodynamics and thermodynamics,and the fluid-solid coupling thermodynamics analysis of the temperature of outer wall is carried out by using the fluid simulation software to obtain the optimal water flow of the equipment cooling cycle in the actual working condition.Finally,the cooling test of the upper cover is carried out to test the cooling effect of the cooling waterway and its temperature distribution.The program of the pneumatic circuit system is designed,including the design of gas delivery system and vacuum system,and the relevant three-dimensional models are established.And finally the selection of the main pneumatic equipment such as vacuum pumps is completed.At the end of this paper,the PID control system of the surface reaction temperature is designed,and the selection of the main equipment has been completed.And then the initial planning of the equipment panel system and alarm system has been proposed to improve the function of the equipment.The research work in this paper has laid a solid foundation and provided theoretical basis for the development of HFCVD diamond film deposition equipment,and speeded up the development process of the equipment.
Keywords/Search Tags:Diamond film, Hot-filament chemical vapor deposition(HFCVD), Integrated design, Finite element simulation
PDF Full Text Request
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