Preparation And Photoelectric Properties Of Heavy Doped Metal Oxide ITO Films

As one of the basic components of the optical system,the lens plays a pivotal role in the optical path propagation of optical instruments,from mobile computer screens and various types of glasses that are closely related to us to various optical components on space shuttles and manned spacecraft.Lenses are the most important basic optical components.Speaking of the lens,it is inseparable from the various types of films coated on the surface of the lens,such as the anti-blue film on the screen of the mobile phone,the anti-reflection film on the observation window of the device,and so on.Films have a wide range of practical applications as the basic unit of lenses.Different films realize different functions.ITO film has various special properties as widely studied heavy doped metal oxides,such as low resistance and high permeability,plasmonics adjustable,etc.,in solar cells and electromagnetic shielding.The irreplaceable advantage,for this reason,we focus on the preparation technology of ITO film,and study the changes of its photoelectric properties and plasmon characteristics under the conditions of the preparation process.The design and optimization of the film model are briefly explained.The research results mainly include:1.Introduced the characteristics of photoelectric and plasmon of ITO thin film,and the significance of real-time physical development under this characteristic,and expounded the application of cutting-edge ITO characteristics and industrial product optimization.2.Analyzed the current mainstream ITO preparation technology,and focused on the electron beam evaporation equipment used in this paper;analyzed the practical problems encountered in the vacuum evaporation ITO process,and explained the technology and working principle of the coating process.The ideal ITO coating conditions of the experimental instrument were explored,and the key influencing factors were simulated and the experimental conditions were evaluated.3.Analyze and theoretically simulate the various properties of the prepared ITO film,and introduce the operation and principle of the instrument used,including analysis of spectrophotometer,ellipsometer,field emission scanning electron microscope and X-ray diffraction.The instrument is equivalent to all instrument working mechanisms related to the characterization of this experimental sample.4.The design of single-layer ITO film based on the negative feedback of the test instrument was completed.The optimal process parameters under the experimental conditions were determined by TFCalc software simulation and optimization,and experiments were carried out in the experiment.The K9 glass sheet with low resistance and high transmittance ITO film has low resistance and high permeability in the visible light range(380?750nm),and the average transmittance in the optical band is over 88%,and the film resistance is about 10???.Can be used for basic research on low-end displays.5.Through cross-experiment and theoretical analysis,a single-layer ITO film with different parameters was designed under the condition of changing the coating process.The performance of this series of samples was characterized,and the plasmon of the ITO film prepared under the experimental conditions was confirmed.Adjustable features.