The Experiment And Theory Simulation Of Carbon Films Deposition On Different Power At Atmospheric Pressure Plasma Driven By Dual-Frequency

Much attention in recent years,the Dual-Frequency(DF)plasma could obtain the relatively high energy and density from small simple devices,improve the reaction rate and utilization rate of raw materials in the plasma.In this paper,the needle-ring electrode structure is convenient and small,could gain the relatively long plasma plume and the density is 1011-1012cm-3,the Dual-Frequency plasma has wide space,and activity is stronger,and can handle more complex ang larger materials,especially in deposited films,which can effectively promote the formation of film components and corresponding morphology.It can be said that the dual-frequency plasma combines the higher reaction energy of a single low frequency with the spatial advantages of the radio frequency plasma.Based on this advantage,the paper used in dual-frequency(100k Hz / 100MHz)plasma under different power of 0,100,120,140 W to prepare carbon nano-films with carbon tetrachloride(CCl4)and methane(CH4).Although the dual-frequency atmospheric pressure plasma has such advantage,its deposition mechanism is not clear,so this paper added numerical simulation.Numerical simulation plays an important role in the study of gas discharge and atmospheric pressure plasma.There are different models to simulation the gas discharge,the fluid model,MC/PIC model and hybrid model are commonly used.These models have been used study the distribution of time and space of inside of the plasma physical parameters,such as the electric field distribution and electron density and ion density,etc..Therefore,the main work of this article has the following two parts,which are as follows:(1)Under atmospheric pressure with carbon tetrachloride(CCl4)as carbon source,the Dual-Frequency(100 k Hz/100 MHz)drive CCl4/Ar plasma in the synthesis of amorphous carbon film.By changing the Radio-frequency power,the results show that with the increase of RF power,the carbon species increased in spectrum of plasma,and the center area of the film increases,and the morphology is thin and smooth,and the dot construction transformed the layer structure.The hybrid model simulate the neutral particle energy and angle distribution,with the increase of RF power,electron density and ion density increases accordingly,and sheath is thinner but more effect on acceleration of charged particles;Neutral Particles AngleDistribution(NAD)mainly concentrated in the 0°to 4°,and there will be a little expansion and shift as change of RF power.The ion energy and temperature has little impact,electron density and energy of the Energetic Neutral-Atom(ENA)is add with the increase of RF power,so the angle of ENA scattering changed,the simulation result is consistent with the experimental results.(2)Carbon black(CH4)is used as the carbon source under atmospheric pressure,carbon film is successfully synthesized in CH4/Ar plasma actuated by Dual Frequency(100 k Hz/100 MHz).By modifying the Radio-Frequency power,the results show that with the increase of RF power,the morphology of carbon black and quality related to radio frequency power and the variety of the electric field,the sample size decreases,it also found that the carbonaceous species types and content of carbon black are the best when the RF power is 120 W,and the morphology is better.The morphology of the black carbon was transformed from the botryoidalis to the layer,and the compactness and uniformity were improved after adding the copper plate to change the electric field.PIC model was used to simulate the particle behavior of plasma.It found that temperature,ion energy,density are stable;compared with the experiment result shows that the RF power influences the density of plasma reaction intensity and ion bombardment energy.