Parameters Optimization Research Of Sub Pixel Scanning Modulation System

Micro-optics elements has gained more and more widely application in optical information processing,optical communications,micro-sensors,super hyperfine processing and many other optical fields.Micro-structure optical device is developing to the miniaturization,array directions,such as the size of the device requirements become more and more small,accordingly makes micro-optics element method that make the demand is higher and higher.In view of the production micro-optics element lithography technology to overcome the efficiency is not high,research of improving the resolution of the problem,it puts forward a new methods of digital mask production technology based on the digital micro-mirror device of micro-optics elements.This paper based on the theory of DMD digital mask production technology research and simulation through the experiments to scan Angle theta and step length matching optimization of experimental parameters,such as research,realize the feasibility of improving resolution,and explore the influence of the error on imaging quality for exploring the method of making the micro-optics element provides a new way.The research work of this paper is as follows.1 The principle of the photo lithography technique of sub pixel scanning is studied in detail,and the mechanism of improving by the single directional scanning modulator digital mask.Design several optimization of digital mask respectively,including binary grating mask,micro lens mask and micro lens array,through simulating the mask along the different Angle of single direction of accumulated exposure to verify the pixel scanning lithography modulation and feasibility to improve the lithography imaging quality.2 It is set the sub pixel scanning lithography modulation system,and it introduces the various optical components in the optical path system,and the role of optical path adjustment method in detail,and the light source in lithography system parameters,such as scanning parameter are optimized.The matching of optimal scanning parameters is obtained through the simulation experiment,which is the optimization match between the scanning step and the Angle of tilt.3 It through a lot of experimental research,in-depth grope for the experimental process,explores the different parameters and the influence of different experimental conditions on the production results,good experimental parameters are obtained.