Simulation Of Three-dimensional Micro-Structure Fabrication With Electron Beam Lithography

Electron beam lithography is an advanced technology for micro-nanofabrication and analysis, which is a key technology in decreasing microstructure size. EBL has many advantages, such as high resolution ratio, easily to be controlled, high precision and can fabricate microstructure on the photo-resist without expensive masks. This advantages make it a micro-machining technology research hot spot. Accurate simulation the machining process of three-dimensional microstructures can effectively shorten the development cycle and save the cost of experiment. The novel technique about electron beam lithography have been investigated in this thesis. The technique is able to produce three-dimensional structure on the photo-resist. Energy deposition model is established by using Monte Carlo method to obtain the process parameters. Then using cellular automata and devemental hybrid algorithm simulate the microstructure which obtained by experiment. Finally using the method of exposure dose correction improve the resolution of the microstructures. The main research work can be summed up as follows:1.Electron scattering model has been built to simulate the interaction of electronics and solid, which is based on the theory of EBL.2.Energy deposition model is established by using Monte Carlo method to obtain the processing parameters. And explore the influence of various process parameters on the energy deposition.3.Different doses are controlled to fabricate three-dimensional structures which is based on the experimental scheme.4.For electrons scattering unsystematic and microstructure hard to accurately simulate. the novel puts forward cellular automata and Monte Carlo hybrid algorithm, and using the algorithm and cellular automata algorithm simulate microstructures obtained by experiment. Use of exposure dose correction method to improve the resolution of the microstructure.