| Ciprofloxacin residue caused great harm to the ecological environment,for example,causing resistance to medications for the pathogenic bacteria,so that it will gradually lose their effectiveness,and severely threatened human health as well as the sustainable development of society.Meanwhile,the ciprofloxacin,possess high toxicity,is usually stored in trace/ultra trace form in the environment.Photocatalytic technology is a kind of low-cost,non-polluting and high efficient advanced oxidation technology which used the semiconductor as catalyst and sunlight as energy source that can degraded the pollution into H2 O,CO2 and other non-toxic harmless small moleculars.ZnFe2O4,a common magnetic photocatalysis semiconductor material,the narrow bandgap,excellent photochemical stability and strong magnetism made it occupied a position of prestige in the field of photocatalytic.Besides,The molecular imprinted polymer had specific recognition property were prepared by molecular imprinting technique,which will lead the contaminants that in the form of trace/ultra trace can be preferentially enriched on the surface of the catalyst in the environment;Meanwhile,the properties of polymer is stable,low cost,green process and is easy to mass production.Therefore,this paper combines the advantages of photocatalysis technology and molecular imprinting technology to synthesize imprinted photocatalysts with highly selective removal for specific pollutants,and the removal efficiency of ciprofloxacin by different imprinted photocatalysts with different synthetic factors was also investigated.This work mainly includes three aspects as following:（1）ZnFe2O4@ZnO photocatalyst were synthesized by an impregnatingcalcination process and take it as carrier,then,the surface imprinted layer was coated on the surface of Zn Fe2O4@ZnO by molecular imprinting technique and then the ZnFe2O4@ZnO imprinted composite photocatalyst were successfully synthesized.The morphology,structure and property of as-prepared photocatalyst were characterized by XRD,FT-IR,SEM（EDS）,TEM,UV-vis DRS,VSM,PL,EIS,N2 adsorptiondesorption experiment,XPS and ESR etc.Besides,the effects of different the amount of composite ZnO and different adding dose of monomer on the photocatalytic activity of ciprofloxacin were also detailed investigated.Finally,the selective degradation effect of Zn Fe2O4@ZnO imprinted composite photocatalyst on ciprofloxacin were investigated compared with enrofloxacin and 5-sulfosalicylic acid,respectively.（2）ZnFe2O4 is prepared by the solvothermal method,and then the conductive imprinted polymer layer is coated on the surface of ZnFe2O4 to prepare the ZnFe2O4/PPy imprinted composite photocatalyst.The morphology,structure and property of as-prepared photocatalyst were characterized by XRD,FT-IR,SEM（EDS）,TEM,UV-vis DRS,VSM,PL,EIS and N2 adsorption-desorption experiment etc.In addition,the effects of different polymerization time and different addition dose of pyrrole on the photocatalytic activity of ciprofloxacin were detailed investigated,and its application of selective photocatalytic degradation were discussed,and the mechanism of selective photocatalytic reaction were elucidated.（3）Zn Fe2O4-Ag/PATP imprinted composite photocatalyst with selective photocatalytic degradation ability were prepared by the solvothermal calcination method and molecular imprinting technique.The as-prepared photocatalyst were characterized by XRD,FT-IR,SEM（EDS）,TEM,UV-vis DRS,VSM,PL,EIS,N2 adsorption-desorption experiment and XPS etc.Moreover,the effects of different the amount of Ag and different adding dose of monomer on the imprinted photocatalyst were also detailed investigated.At the same time,the selective degradation effect of ZnFe2O4-Ag/PATP imprinted composite photocatalyst on ciprofloxacin were investigated compared with enrofloxacin and 5-sulfosalicylic acid,respectively.Finally,the mechanism of selective photocatalytic reaction were discussed. |
