Deposition And Characterization Of TaAlN/Ag/TaAlN Low-E Film

A low-emissivity filter has a very high visible light transmittance and high far infrared reflectance. It has been widely used in the architecture in order to achieve energy efficiency buildings. With the extensive application of Low-E glass and the in-depth study on the film, the stability of coatings has become a research focus. The silver-based Low-E coatings are widely used for insulating glass units because of their high transparency in the visible region and low emissivity. The silver-based Low-E coating,however,is not durable against mechanical abrasion, chemical agents, high temperature treatment and moisture degradation mechanism. So it is extremely important to select suitable cover layer to protect the silver film and extend the use of Low-E glass effectively. Owing to its superior mechanical properties and corrosion resistance, as well as oxygen-free in preparation, the TaAlN film is an ideal protecting material for Ag layer of Low-E glass.All films were prepared by the RF-magnetron sputtering on glass slides. The substrate was not intentionally heated. Three targets of Ag,Ta and Al were used; N₂ was added as reactive gas. All samples were characterized by ultraviolet-visible spectrophotometer?UV-VIS?, surface profile-meter, Fourier transform infrared spectrometer?FTIR?, XRD, SEM and so on.In this work, the effect of deposition parameters such as Ta sputtering power, Al sputtering power,nitrogen flow rate and sputtering time on the optical performance of TaAlN films were investigated, and also did the crystalline structure and morphology of TaAlN thin film.The The film TaAlN used as low radiation film dielectric layer, design the TaAlN/Ag/TaAlN composite films and study of preparation process parameters of optical properties of the composite membranes and resistance to corrosion, and the structure and composition of the composite membrane were studied.When the Ta sputtering power was 110 W, the Al sputtering power was 100 W,the nitrogen flow rate was 5sccm and the sputtering time was 40 min in this experiment, the visible light transmittance of TaAlN film could reach up to 87.5% at the wavelength of 550 nm and the emissivity was 0.59.The TaAlN thin film was amorphous, bears responsibility for improving the stability of multilayer film. When the configuration of composite film was TaAlN?32nm?/Ag?10nm?/ TaAlN?32nm?, the visible light transmittance of composite film could reach up to 85.1% at the wavelength of 550 nm and the emissivity was 0.102. In addition, the chemical durability of coatings was evaluated and the results indicated that the Low-E coating presented very good chemical durability.