| Due to the increasing harmness of ultraviolet radiation toward humans health and aging of goods and the energy shortage problems, to achieve a multifunctional coated glass with ultraviolet-shielding and infrared-reflecting performances has been drawn extensive attention to many researchers. According to the current status of domestic multifunctional coated glass industry, most products were manufactured by off-line coating technology. However, high costs of this technology was not suitable for the popularity of application. Therefore, in this paper, the single-layer TiNx films and double-layer TiO2/FTO films were prepared by an APCVD small coater, which can consistent with the process of on-line CVD coating technology, for the purpose of developing several films which can be producted by on-line CVD coating technology.APCVD small coater was applied to prepare silngle -layer TiN films on glass by using TiCl4 and NH3 as precusors. The influences of different coating parameters (including: substrate temperature; the flow of TiCl4 and NH3; the moving speed of substrate) to the components and microstructure of TiNx films were investigated and then the effect laws of its optical and electrical properties can be obtained.Additional, a double-layer TiO2/FTO films (TiO2 as the top-layer; FTO as the under-layer) was also prepared by using MBTC, TFA and TTIP as reactants, and the influence laws of the variation of TiO2’s thickness on the entire TiO2/FTO bilayer films were also studied.The research shows that:TiNx films can form with high efficiency up than around 510℃, between the range of 510℃～580℃, with the substrate temperature increasing, the crystalline properties of the films can be improved, N/Ti ratio gradually become normal stoichiometry, then the performance of ultraviolet-shielding, solar-control and low emissivity enhanced, but the relevant properties of the films deteriorated after the temperature exceeded 580℃; the flow of TiCl4 was kept at the range of 7.5ml/hr～17.5ml/hr, when the flow of TiCl4 increased, the particles turned from short and small granular into enlongated strip particles, and the properties of ultraviolet-shielding and conductive were improved, while the reflectivity in near infrared region decreased; the flow of NH3 was kept at range of 200ml/min～400ml/min, with the flow of NH3 increased, the number and uniformity of the particles increased, so it can improve the desity of the films, the N/Ti increased from 0.83 to 1.16, which made the conductive increase first and then decrease, the near-infrared-reflecting ability showed a trend of decreasing, but the ultraviolet-shielding performance inproved; with the substrate moving speed which was kept at 1mm/s～5mm/s range increased, it was not suitable to form the TiNx films, which rendered the properties of conductive and ultraviolet-shielding become more poor. Based on the above analysis and take the cost and productivity efficiency into account, when the substrate temperature keep at 580℃, the flow of TiCl4 and NH3 are 15ml/hr and 300ml/min respectively, and the substrate moving speed is 2mm/s, the overall performance of TiNx films shows best. The specific results are:the ultraviolet less than 380 nm can be blocked completely, the square resistance can reach to 3.2Ω/□,the shading coefficent can reach to 0.67, and it also has certain reflecting ablility at the near infrared region.According to the research on the optical and electrical properties of TiO2/FTO bilayer films, which the results showed that:with the thickness of TiO2 film increased, the transmittance of TiO2/FTO bilayer films samples at ultraviolet-visible spectra gradually reduced, and the reflectivity in the high-frequency of near infrared region increased, which exhibited certain solar-control and ultaviolet-shielding ability; while the conductive of the TiO2/FTO bilayer films gradually deteriorated, then lessen its low emissivity performance. Since the forming time of TiO2 film is short, so it shows amorphous. However, the under-layer FTO films affects the morphology and density of top-layer TiO2 films, which made its ultraviolet cut-off wavelength redshifted. |
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