| In this thesis,the theoretical design and experimental preparation of transition metal / medium photothermal conversion film structure are studied,at the same time,the fabrication methods of the film structure are deeply investigated.In theory,the transmission matrix method is used to screen a best combination of 30 transition metal/dielectric configurations,i.e,8 layer Ti/SiO2 film structure([Ti/SiO2]8).In the experiment,the structure of the film was prepared by magnetron sputtering,and its performance parameters were characterized.The characterization results showed that the structure of the absorption efficiency reached 98.3% in the range of 250-2000 nm region,compared to the 6 layer structure greatly broaden the absorption spectrum and enhance the absorption efficiency.Thermal radiation loss as low as 0.18 in 700 K,the energy loss of effective suppression caused by thermal radiation.When the incident angle is 60 degrees,absorption the efficiency was more than 90% in the 250-2000 nm band,exceeded the incident angle on the photo-thermal conversion process.The structure also has good thermal stability at temperature lower than 723 K,and can be widely used in low temperature thermal converter variety.Surface is very smooth,and AFM test results show that the surface roughness is less than 1nm.This thesis focuses on the 8 layers of the Ti/SiO2 thin film structure component and manufacturing method of in-depth research,found that doping Ti in the SiO2 can effectively change the optical constants of SiO2,and by changing the doping ratio of Ti,the optical constants can control the mixed material.Therefore,a Ti-SiO2 hybrid material which matches the optical constants of metal Ti is obtained by controlling the proportion of metal Ti accurately.Using this material instead of the Si O2 can achieve the purpose of reducing the number of layers and optimizing the film structure under the premise that the overall performance of the film structure remains unchanged. |
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