Fabrication And Application Of Film Microstructure On Optical Surface

Thin film micro-optics elements further utilize thin-film microstructures with multi-layer features,introducing interference effects on the basis of refraction,reflection and diffraction,and the microstructure is more complex and diverse,thus exhibiting novel optical properties and achieving complex optical properties modulation.This paper mainly studies the preparation process of thin films microstructure on optical surface,including the preparation of single layer and multilayer film by PECVD method,making master by single point diamond technology,nano imprint lithography technology for the preparation of soft seal and graphic transfer,plasma etching for shaping,and specific conclusions are as follows:PECVD method is used to deposit silicon oxide films with a refractive index of 1.46 on silicon and ZnS substrates.The deposition rate is 42.22nm/min and 47.64nm/min under the optimum deposition conditions.On this account,with the increase of deposition thickness,the stability of silicon oxide thin films with refractive index of 1.46 is studied.There is no obvious fluctuation about the refractive index.The membrane stress on silicon substrate has no obvious change,but the membrane stress on ZnS substrate significantly increase obviously.The oxynitride film with refractive index of 1.5,1.6,1.7 and 1.8 is deposited on silicon.The optimum technological conditions for the deposition of thin films are obtained.The graded refractive index films are deposited under these four kinds of refractive index.The nitrogen oxide thin films with refractive index of 1.8 and thickness of 100nm,200nm,500nm and 900nm are deposited.On the basis of the preparation of the mold made by single point diamond technology,the structure of pyramid with a base area of 10?m×10?m and a height of 5?m was prepared by using nanoimprint lithography and plasma etching technology in silicon substrate coated with silicon oxide and silicon oxynitride.The micro morphology of microstructure is clear,which period is 10.5?m×10.8?m,height is 4.57?m.The relative error of the available period is 5%?8%,the relative error of the height is 8.6%,the causes of the deviation of the experimental results are analyzed.The experimental results are analyzed.The spectral properties were analyzed by using the equivalent medium theory and the finite element method.With the simulation of a single pyramid microstructure,the results show that the reflected light field is periodic and the period increases with the increase of wavelength.