Photocatalytic Properties Of TiO₂ Films Deposited By Energy Filtering Magnetron Sputtering Technique

TiO₂ is a typical photocatalytic material.Under the ultraviolet light irradiation,the organic pollutants can be effectively degraded into small molecules such as CO2 and H2 by TiO₂,so as to achieve the purpose of dealing with organic pollutants.It is considered as a powerful way to solve environmental pollution and energy crisis.TiO₂ films has become one of the typical photocatalysts with good chemical stability,abrasion resistance,low cost,non-toxic and easy recovery.It has been widely used in production and life,such as photocatalysis,self-cleaning glass,solar energy batteries and other fields.Among the many preparation methods of TiO₂ films,DC magnetron sputtering?DMS?technology has the advantages of good controllability,fast sputtering rate and the preparation of TiO₂ films with good optical properties and so on.The results show that the photocatalytic efficiency of TiO₂ is affected by its crystal form,particle size and specific surface area.It is possible to improve the film quality,reduce the grain size,improve the uniformity of the film,increase the specific surface area and improve the photocatalytic efficiency of the films by using the energy filtration magnetron sputtering?EFMS?technology.In this paper,TiO₂ films were fabricated by using DMS and EFMS.The structure,optical properties and photocatalytic properties of TiO₂ films prepared under different conditions were studied.The research contents are as follows:?1?The TiO₂ films were prepared by DMS technology.The effects of deposition temperature,pressure,sputtering time and oxygen-argon flow rate on the structure,surface morphology,optical properties and photocatalytic properties of TiO₂ were investigated.The better photocatalytic efficiency of the film is obtained by optimizing the preparation conditions by controlling the variable method.The results showed that the TiO₂ films prepared with the deposition temperature of250 ?,the pressure of 1Pa,the deposition time of 1h and the oxygen-oxygen flow ratio of 6:30 had the best photocatalytic properties.?2?The TiO₂ films were deposited by both of DC magnetron sputtering?DMS?and energy filtering magnetron sputtering?EFMS?technique on glass substrates,respectively.EFMS outperforms the conventional DMS in many ways,such as the smoother surfaces,smaller grains,and a much higher photo-catalysis.?3?The TiO₂ films and double-layer TiO₂ films were deposited by DMS technique and EFMS technique.Compared with the TiO₂ films,the photocatalytic properties of the double-layer TiO₂ films is higher than that of the TiO₂ films.The photocatalytic efficiency of the laminated TiO₂ films prepared by EFMS was the highest at 41.2%,which was about 1.7 times that of the monolayer films.