Research On Suppressing The Disturbance In Macro-system During Processes Of Dual Wafer Stages Exchanging

Dual wafer stages exchanging is the core of developing lithography, and is the premise of completing the following task of scanning photolithography. The process of stages exchanging requires high speed and precision, so the existence of the disturbance can easily lead to the failure of stages exchanging. However, the macro-system in dual wafer stages is mainly responsible for large stroke linear motion and in order to ensure the continuity of exchanging stages, its duplicate positioning accuracy must reach micron level. In this paper, the motion of macro-system is summarized as single motor positioning movement in the X direction and multi-motor synchronous movement in the Y direction, and there goes research on their disturbance suppression technology. What’s more, on the basis of the simulation the paper designs the corresponding disturbance compensation and then it’s carried out disturbance suppression experiments during the processing of dual wafer stage exchanging, which greatly increases the anti-disturbance ability of the whole system.At the very beginning, based on structural features of dual wafer stage and the trajectory planning of stages exchanging, the paper analyzes the motion of macro-system in stages exchanging, and then discusses the necessity for macro-system disturbance analysis as well as the possible disturbances in macro-system.Secondly, it makes the possible disturbances in single motor positioning movement in the X direction into analysis and suppression. To this end, starting from the principle of a linear motor, it concludes that positioning force disturbance is the main disturbance in that process, and then it carries out experiments to identify the positioning force disturbance model on the experimental platform which combines the mechanism of positioning force generating. Subsequently, in the premise of guaranteeing the robust stability, it designs the disturbance observer to compensate the positioning force disturbance and makes simulation test.Again, the disturbance in multi-motor synchronous movement in the Y direction is analyzed and suppressed. Combined with the existing synchronous control strategy, it describes the synchronous control strategy based on disturbance compensation which sets the disturbance observer application at compensation loop, and it also makes some simulation research. Then as for the load disturbance, the paper designs dynamic load disturbance compensation and modifies the synchronization control strategy, which effectiveness is verified by simulation.Finally, it carries out macro-system disturbance suppression experiments on dual wafer stages and the anti-disturbance ability of the whole system reaches to a certain extent. Then by solving some practical problems encountered in debugging about the hardware and software, including multi-motion control cards and memory expansion and other related issues, the entire exchanging stages successfully has been achieved. Not only it meet the accuracy requirements of the system indicators, but on the basis that the exchanging stages speed reaches a certain level, it greatly increases the anti-disturbance ability of the whole.