Research On Channel-changed Control Algorithm In Lithgraphy Machine

Lithography machine is a multi-subject equipment which involves with measurement,testing,optical,electrical and other professional fields.Because of this,it represents the highest level in integrated manufacturing area for one country.Optical measurement accurary will be a add for lithography system.In addition,the stability of electrical devices make a contribution to this device.Last but not least,Lithography machine depend on control algorithm.It is the control algorithm that makes lithography system running accurately.As a part of lithography system,precision motion platform services as a basic component for coarse and fine motion stage.It is adopted by H structure so as to make the motion stablily.Channel-exchanged process is finished on this campaign platform.the channel-exchanged process is the key for lithography system,which maybe lead to the failure to control system.The failure can be a damage for mechanical device.So,the analysis about channel-exchanged is priority to any other subjects. It is our duty to take actions to analyse the precision motion platform.Revolution motor,rotation motor and X,Y axis motor are the entire motion devices. Channel-exchanged process need these equipments. X,Y axis motor provides space for the motion of rotating.As a result,direct current motor is resolved firstly.When the direct current motor mathmatical model is established,the compound control strategy is used to control it.Revolution motor is the core of the channel-exchanged process.On the one hand,It connects the motor of rotation both in the left and right side.On the other hand,it ensures the position accuracy which enables the room for the revolution motor.After this,the system adopts the variable structure control strategy and then be verified by simulation.In the channel-exchanged process,the accumulation of error is a difficult problem.It is injurious to the machine control system.The channel-exchanged process is a multi-system.the introduction of multi-body will solve the relative position between the lithography system device.then we can adopt actions to compensate the error.Actually,in the debug, the operation of precision motion platforn model is very good.It brings convenience for the system debug.And it is applied to the control algorithm validly.