Study On Optimization Of Full Field Aberration Of Projection Lens Based On The Extended Zernike Polynomials

The projection lens whose design and manufacturing are extremely difficult is the most core system in mask aligner. It has the characteristics of high NA value and the large field of view, and its imaging performance is extremely high, reaching the optical diffraction limit. In the manufacturing process of the projection lens, machining tolerances and alignment tolerances are very strict. Therefore, the image quality evaluation and image performance compensation are very important in the process of design and manufacture of projection lens. Image performance evaluation is throughout the design process of the projection lens, and it is an important basis for optical system optimization and image performance compensation. Image quality compensation can ensure the realization of the technical indexes of the projection lens and collaborate with the key technology in various stages to reduce manufacturing cost. This paper introduces a set of new polynomials to represent the full-field wavefront aberration of the projection lens, analyses the aberration characteristics of the polynomials, and applies the mathematical model based on the new polynomial in Computer aided alignment of projection lens.This paper mainly aims at the deficiency of Zernike polynomial in the description of the projection lens comprehensive characteristics of aberration, extends a new polynomial on the basis of Zernike polynomial to represent projection lens full field aberration of projection lens- orthogonal aberration function(OAF), uses OAF to represent and analysis full-field aberrations of the projection lens In the ideal case and case containing the machining error, and comparative analysis of the accuracy and the aberration characteristics of OAF. OAF can better classify and quantify aberrations of projection lens. It can represent not only the aberrations of rotationally symmetric distribution, but also the wave aberration characteristics of non coaxial optical system.This paper studies the application of the sensitivity matrix method based on OAF in computer aided alignment technology for projection lens. OAF not only established contact between system wavefront aberration and the field coordinates, can response element maladjustment size by changing the polynomial coefficients.The sensitivity matrix based on OAF polynomial coefficients overcome the field conditions limit, simplifies the mathematical model compensation for projection lens component misalignment, and lowers the difficulty for solving the compensation amount. In the simulation experiment, this paper solves the compensation amount for random adjustment error of the projection lens in the ideal case and with the manufacturing error respectively by the mathematical model, optimizes the projection lens aberration in the case of misalignment of optical elements, verifies the feasibility of full field aberration optimization model based on the OAF, and provides a theoretical basis for the actual install of projection lens.