The Study Of Tio₂Thin Films Deposited By IAD Method

Titanium dioxide (TiO2) is a kind of optical coating materials with multivariatelattice structure，the refractive index of titanium dioxide at550nm can be variedbetween2.2to2.7, which is a good high refractive index material. The ion sourcefluxing coating can improve the film density, the refractive index，the reflectivity andproduct performance. This paper studies the use of ion source fluxing method forpreparing TiO2films and enhance high-performance anti-film.This thesis prepares TiO2films on the GaAs substrate with an ion source fluxingmethod which is applied to the high anti-film laser film lines. Paper tests the adhesion,the reflectivity and the refractive index of the sample comparatively, analyzes themicroscopic characteristics of the film with SEM and the improvement of theperformance of thin film using the ion source fluxing method, discusses therelationship between film and ion-assisted deposition film forming process parameters.The film transmittance, refractive index parameters are calculated based on the theoryalgorithm of optical film. Paper compares the optical properties of TiO2thin films andother materials commonly used in films advantages and disadvantages, contrasts theenhance of before and after the use of an ion source fluxing optical properties of TiO2thin films. Through the experiment, we find five kinds of optimized depositionconditions affecting the characteristics of TiO2thin films(five main factors: substratetemperature, the degree of vacuum, evaporation rate, O2flow rate, ion-assistedenergy), study the ion source fluxing optical film properties under different processparameters. The membrane system and process conditions are applied to the lasercavity surface coating. The laser performance indicators and parametercharacterization are studied.Experimental results show that: TiO2film refractive index increases with theincreasing of substrate temperature; TiO2film refractive index first increases and thendecreases with the increasing of deposition rate; compared with normal evaporationprocess, the substrate temperature under the same conditions, the use of ion-assisteddeposition process can effectively improve the refractive index of TiO2film; the laserdispersion peak power is smallest using ion beam assisted deposition process andaverage peak power is generally higher than normal evaporation process, that is, theion beam fluxing can improve laser performance.