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The Development Of Nanometer Displacement Systems On Measuring Type Ultraviolet Microscope

Posted on:2017-01-11Degree:MasterType:Thesis
Country:ChinaCandidate:X Y ZhaoFull Text:PDF
GTID:2272330485997363Subject:Precision instruments and machinery
Abstract/Summary:PDF Full Text Request
With the development of the semiconductor industry, the number of components become more and more in integrated circuit chip. According to Moore’s Law, the size of devices on chip will inevitably continue to reduce, which leading to line width (also known as the "critical dimension") becomes an important factor affecting the properties of electrical components. The measurement of line width and traceability has become a problem in the field of nano-metrology. Optical microscopes has been widely applied in the field of nano-metrology, which has a lot advantages, such as non-contact, high resolution, fast measurement speed, etc. However, the diffraction limit restricts the resolution of optical microscopy, which make it impossible to achieve accurate measurement. The thesis is supported by the National Science-Technology Support Plan Projects (NO.2011BAK15B01). In order to establish a metrological ultraviolet optical nanometer geometry structure size measurement standard apparatus for line width measuring and traceability, the key technologies is studied.This article first describes the development of nanotechnology line-width measurement technology, and the research status of metrological ultraviolet optical microscope both at home and abroad, as well as the composed of a metrological ultraviolet optical nanometer geometry structure size measurement standard apparatus.Then introduced the key technologies of two-dimensional nano-displacement station. In order to achieve the micro and nano level sports, designing a displacement with PZT and flexible hinge, and using the ANSYS to simulate and optimize the mechanical structure. Build two-dimensional nano-displacement station, and design a laser measurement system to calibrate the movement characteristics of two-dimensional nano-displacement station. In software, making a programming to control the movement of two-dimensional nano-displacement station with high precision and low-noise.This article then describes the implementation method of a wide range of two-dimensional flotation displacement station. It also introduces the composition, and uses the ANSYS to simulate and optimize the mechanical structure in order to verify the effectiveness of the station. It also complete the verification of motor based on the performance of two-dimensional flotation displacement station. In order to verify the feasibility of the station, it also design a laser measurement system to calibrate the movement characteristics of two-dimensional flotation displacement station. In software, making a programming to realize the PID parameter adjustment and automatic control of the motor.Finally, in order for the two-dimensional nano-displacement station and a wide range of two-dimensional flotation displacement station to achieve traceability, construct a traceability system and complete instrument system verification. In addition, it also analyze the error of the displacement and metrological traceability system. Make some experiments to trace the standard mask, in order to verify the feasibility of the system.
Keywords/Search Tags:Metrological ultraviolet microscope, Nanometer displacement, Laser interferometer, Error analysis
PDF Full Text Request
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