Research On Fabrication Technology Of Silicon Microporous Structure Via Metal Assisted Chemical Etching

Silicon microporous structure prepared by the Metal-Assisted Chemical Etching is widely applied in the conversion of solar energy and heat energy, energy storage, biological sensing, bionic super-hydrophobic and other fields. In recent years, more and more studies about Metal-Assisted Chemical Etching were presented, we hope that morphology controllable and orderliness silicon microporous structure is prepared by Metal-Assisted Chemical Etching.In this paper, silicon microporous structure was prepared by Ag-Assisted Chemical Etching method which is simple and well maneuverability. And, the effect of the prepared condition on the surface morphology of silicon microporous structure was investigated too. The first step, the state of the density and distribution of Ag particles deposition on silicon substrate were controlled by adjusting time. The result shows that the largest surface coverage can reach62%. In the second step, the growth of the silicon microporous structure was controlled by adjusting the reaction time and H₂O₂concentration. The result shows that the pore size of silicon microporous structure is around50nm under the condition of0.3mol/L H₂O₂and5min. Furthmore, based on the understanding of Metal-Assisted Chemical Etching method and the formation of the silicon microporous structure, we present some pinions about the choice of solution.