Diagnostics And Research On The RF Plasma Of Low-Pressure No Based On Laser Induced Flourescence

Fluorescence excitation spectrum of NO (A2Σ+-X2Π) in low-pressure NO plasma is mainly detected based on the method of Laser induced fluorescence and of pumping LPX200Dye Laser by Nd:YAG Laser in this paper. Then we detected NO plasma molecules from ground state to excitation state. Through the imaging system of IRIS (Instrument for of Radicals Interacting with Surface) of larger volume and higher-vacuum, the fluorescence picture and the image of spectrum resolution are detected by ICCD (Intensified Charge Coupled Device) camera.Fluorescence intensity is measured which is influenced by both RF discharge plasma power and the variation of gas pressure at the wavelength of226.2nm. In addition, the influence of different padding in chamber of IRIS on NO (A2Σ+-X2Π) fluorescence intensity is showed.The results showed that at UV light waveband ranging from205nm to240nm and near the wavelength of226.05-226.20nm, the NO(A2Σ+-X2Π) fluorescence excitation spectrums coincide with the theoretical results. In addition, when quartz chip was filled into the main chamber, it can hardly influence NO fluorescence intensity. However, the result was opposite to the molecule padding Co because of its special structure with some small holes which can physically absorb partly some NO gas molecules to diminish its fluorescence intensity.