Analysis And Research Of TFT-LCD Production Capacity Of Lithography

Thin Film Transistor-Liquid Crystal Display (TFT-LCD) has been widely used to replace the Cathode Ray Tube (CRT) display and TV equipment, as it is now the most important display technology to enrich people’s daily lives and it has made a great contribution to the information exchange. For the high building and running expense, and the high technology requirement, a great deal investment of capital and human resource are needed. In order to make the inherent resources more productive, improvement of manufacture capability is very important and becomes the main topic in our research.This thesis consists of three parts:firstly, there is a brief introductiontothe development of TFT-LCD and its structure and display principle. Manufacturing process of LCD panels was also introduced in this part. Secondly, the manufacture flow of Array, Cell and Module were analyzed and we found out that the photo process was the bottleneck of the whole TFTLCD manufacture procedure. Finally, through experiments and technology analysis, we found out that interaction of many factors such as sensitivity and thickness of photo resistor、illuminance of exposure lamp, alignment mode of exposure, transfer time of TFT glass that influence the photo manufacture capability.. The manufacture capability of the photo process can be increased by optimizing factors including exposure material, process technology and manufacture flow. And then the manufacture capability of the whole TFT-LCD has been increased. The contributions of this project will enormously increase the production capability of the domestic TFT-LCD factories which is helpful to be more competitive in the global market.