Study And Design Of Ultraviolet LED Lithography Light Source System

Digital maskless lithography is the necessary technical means on the field ofmicro-nanofabrication. In the IC (Integrated Circuit, IC) manufacturing process,eliminating the need for expensive optical mask, as long as the replacement ofdigital masks (i.e., the data in the computer.) modified, especially suitable for smallparts production, lithography product prototyping, experimental study, it is theresearch focus in recent years. In this paper, a new type of ultraviolet light-emittingdiodes (UV-LED) light source and illumination design techniques combined, it’sproposed maskless lithography system based on the number of UV-LED light sourcesystem, it have miniaturization, simple structure, environmental protection, low-costsignificantly advantages, has important significance.In this paper, based on the analysis of various lithography UV-LED illuminationtechnology for digital maskless lithography, comparing analysis of the merits ofvarious lithography light source and UV-LED as lithography light source advantage.the light source analysis and design, optical design of the light source system, thelight source system computer software simulation of the optical design process, givefull consideration to the light source coherence, the introduction of the partiallycoherent light theory. First, depending on the UV-LED and the illumination regioncharacteristics, the form of the four key part of the structure of the converging inputunit of the illumination system, the beam shaping unit, a uniform light unit and alighting output unit were analyzed to determine the overall scheme of the lightingsystem. According to the requirements of the lighting system indicators, calculateddesign parameters for each unit. Secondly, the respective units of the UV-LEDillumination system design simulation. Give full consideration to the importance ofuniformity of illumination and solar energy utilization efficiency on design UV-LEDlithography light source system.The follow is the major research work of this paper:1、Through access to the latest literature, full research analyzes the advantagesand deficiencies of the existing lithography illumination system, which leads to the main contents of this article-UV-LED lithography lighting technology, as well asthe necessity of the technology research.2、Comparative analysis of the strengths and weaknesses of the existinglithography light source, UV-LED as lithography light source has obviousadvantages. And selected in accordance with the requirements of the lithographysystem, to ensure the stability of ultraviolet output light source driver.3、According to the optical characteristics of the UV-LED, the design of thecondenser input unit, the beam shaping unit, the uniform light unit, designedaccording to the lighting requirements of the uniform light beam out of the natureand lithography system, the illumination output unit.4、UV-LED the lithography lighting system in ZEMAX optical softwaresimulation, and its output light performance optimization, system processingprogram after determining experimental platform. And experimental study of simplepractical lithography, the experimental results are analyzed and discussed. Come tothe CPC and the fly’s eye lens array combined with the practical feasibility oflithography lighting design.