Preparation And Photocatalytic Properties Of Titanium Dioxide Thin Films

With the development of technology and modern industrialization, environmental pollution problems become increasingly severe. In order to deal with avarieties of harmful substances, a variety of physical, chemical, biochemical and other methods of industrial production came into being generated, but most methods exist some shortcomings,for example long cycle, large investment, and other degradation is not thorough enough. In1955, it marked the beginning of modern photochemical theory that Brattain and Garret found the phenomenon of photovoltaic germanium semiconductor electrodes.In1972, Fujishima discovered the N-type semiconductor TiO2could electrolysis water under the irradiation of in light, this phenomenon announced the arrival of the new millennium that use photoelectric catalytic method to solve the pollution problems.As we known the photocatalytic technology,simple to operate, easy to control, high efficient decomposition of pollutants, single equipment, has opened up the new research directions about the organic dye, biodegradable industrial wastewater environmental pollutants.The first chapter describes in detail the physical and chemical properties of titanium dioxide, the basic principle used as photocatalytic and improving the way of the photocatalytic titanium dioxide photocatalytic properties, and introduced the prospect of titanium dioxide in the environmental field.The second chapter describes common methods for preparing TiO2films as well as the advantages and disadvantages of various of preparation methods, focusing on introduce the machine of this experiment RF magnetron sputtering. Characterization of the film as a simple introduction, and a detailed description of principle magnetron sputtering apparatus for preparing TiO2films and the decomposition principle of methyl orange.The third chapter describes the operating procedures for preparing TiO2thin films by magnetron sputtering apparatus, and a detailed description of the preparation of TiO2target and the experimental procedure TiO2films.The fourth chapter discusses the influence of substrate temperature and sputtering power of titanium dioxide thin film transistor structure and photocatalytic properties. The film samples detected crystal to change by XRD, By atomic force microscope to detect the film surface; Calculating the particle size change of the film surface roughness by the formula; The use of methyl orange decomposition under UV irradiation to illustrate the photocatalytic properties of the film.The fifth chapter focus on discusses the the difference effects of annealing temperature and the annealing time on the structure and photocatalytic properties of TiO2thin films. By UV-visible spectroscopy analysis its optical properties; Calculating the indirect band gap by extrapolation bandgap film samples; Through XRD detected the phase changes of crystalline thin film samples with increasing annealing time; Finally, through the atomic force microscope (AFM) to observe the morphology of the film surface.