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Fabrication And Performance Of Microplasma Device Array For Maskless Nanoscale Material Etching

Posted on:2015-03-28Degree:MasterType:Thesis
Country:ChinaCandidate:H JieFull Text:PDF
GTID:2251330428499989Subject:Measuring and Testing Technology and Instruments
Abstract/Summary:PDF Full Text Request
In traditional microfabrication method, mask is utilized to micropattern process. This process costs lots of time and money. In order to realize maskless etching process, we had proposed a microplasma etching method based on scanning probe, that is integrating the microdischarge device on the cantilever probe to realize high accuracy. But the cantilever structure is complex and susceptible to damage in the experiment. Therefore, our research group proposes a non-cantilever structure for maskless etching so called tip array structure. Compared with the cantilever probe structure, microplasma tip arrays is stronger and can achieve high efficiency of etching process. It can be used in high precision, large area of the etching process. This paper mainly studies the core part of the maskless etching method---microplasma tip array, including its structure design and performance.In structural design part, we optimized the spacing between microcavity units according to the heat coupling effect. Using Comsol Multiphysics to simulate the thermal effects. We optimized the thermal effect on the device to a minimum.On the fabrication of the device, this paper introduces the fabrication process of the tip array microdischarge device and optimizes part of the process parameters. Silicon oxide film process is optimized to make the procedure more simple and clear.For the sake of using for tip array maskless etching, this paper makes some test for detailed characterization of the discharge performance. Several factors that might influence the discharge performance were tested and compared. These factors include different ballast resistance, the number of tip arrays, the size of the microcavity, gas pressure and gas type. Optimize the various parameters in the electrical measurement to achieve stable discharge performance and also make the maskless etching process more efficient. This work may lay a good foundation for the maskless etching process based on microplasma tip array.
Keywords/Search Tags:microplasma, microdischarge array, tip array, maskless etching, â…¤-â… characteristic
PDF Full Text Request
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