| Since the21stcentury, surface Plasmon polariton has been a field of rapiddevelopment, studies of surface plasmons polariton have been attracted more andmore scientists’ interests of research. It can be applicated in many aspects, such as:super resolution imaging, surface plasmon lithography, SPP(surface plasmonploriton) based antenna, light manipulation and so on. Meanwhile, due to itsapplication, it greatly promotes the development of photonics and lithography. Inthe field of super resolution imaging, the main development of surface Plasmonpolariton is as follows: superlenses, hyperlens, metascreen, superoscillation.Especially in recent years, super resolution imaging system consisting of superlenshas been put forward, and it has been demonstrated the possibility of superresolution imaging. These systems either focus the magnetic field of near field intoa small point, or can resolve the far field beyond the Abe’s diffraction limit, thesesystems can be termed as super resolution system. Based on the application ofsuperlens on super resolution imaging, this paper mainly carried out the followingresearch:This paper use the multi-layer metal/dielectric that joined the metal reflectoract as the superlens model, using the theory of multilayer superlens study theresolution in the photoresist with metal reflector and without metal reflector, alsothe strength of light intensity contrast in the resist. After that, the multilayersuperlens with metal reflector has been further discussed the resolution and lightconstrat in the middle thickness of resist in different cases, different grating period,different structure, different resist thickness. For all these cases, this paper gives adetailed analysis and draws a general conclusion.After improving the structure of multilayer of superlens, this paper usescomsol software simulate and analyze S-parameter of the multilayer superlensstructure, using S-parameter retrieval method computes the electromagneticparameter, analyzing the characteristic of electromagnetic parameter curve,applying the improved multilayer superlens on lithography imaging, study theimprovement of lithography imaging resolution. Research shows that afterimproving the structure of multilayer superlens, because of the influence theelectromagnetic parameter, it makes the resolution and contrast of light intensityincrease higher in the resist. |
