| In this thesis, we plan to produce a two-dimensional hexagonal array of holes in a silicon substrate, that have special optical properties, the light reflectivity of this filter is almost100%. Finally, we make many experiments to get the parameter of the photonic crystal which we wanted.The parameter of photonic crystal structure to the range of filtering, and the parameter of interference lithography are affected. We build the light path of three-beam optical lithography to complete this experiment; we recorded multiple laboratory data of exposures to get the size of photonic crystal structure which is the most similar with the simulation data. And the line defect will be introduced in the completed structure by the process of two-beam optical lithography to fabricate a strip, and then under it we should make use of some chemical methods as to produce a complete defect in the silicon. By this way, we can fabricate the photonic crystal with a large aspect ratio.In the text, we verify the way of changing the angle of incidence beam to change the fill rate of photonic crystals by simulation. And we make the attempt of using two-beam interference to introduce line defect in the photonic crystal structure. we get a the photonic crystal with triangle arrangement, its lattice constant is1.07nm, dielectric cylinder radius is388nm, the background is the air, and silicon dielectric cylinder selected column, where we will have the ideal set point defects in silicon, or a column with the location of the silicon pillar will be removed into the air. This kind of the structure can control the range of wavelength is420nm. Based on simulation, obtained the conclusion of that this structure can be obtained by three-beam interference lithography, and we get the structure by exposure experiment. In this time, the wavelength of incident light is405nm, the incident angle is16degrees. When we want to fabricate the line defect, the incident angle of the two-beam is2degrees. |
PDF Full Text Request