The Experiment Research Of Hydrophilicity For TiO₂Film Prepared By Magnetron Sputtering

This paper adopts reactive magnetron sputtering method to produce TiO2nanometer film on the surface of the silicon. We have studied its technological parameters, such as:the influence to the film crystal structure, composition and hydrophily ability at different deposition time, different oxygen flow rate, different working pressure, different power and different target-substrate distance, finding out the optimum technological parameter. In order to facilitate comparison, in this based on the technological parameters of nitrogen doped TiO2thin films were prepares to study the effect of film structure and hydrophilicity after annealing. We test the films’ hydrophilicity with a contact angle instrument. Using stylus profiler measure the thickness of film. Using X-ray diffraction, X-ray photoelectron spectroscopy, field emission scanning electron microscopy metallographic microscope study the films’ crystal structure, comporition and surface morphology of nano-size particles, and analyze various factors which effect the films’ hydrophilicity.The research shows that:The hydrophily ability of TiO2thin film and N-doped TiO2thin film is related to annealing temperature. After annealing treatment, the contact angle of water on the film surface decline sharply, that is to say, the films’ hydrophilicity is increased. The hydrophilic of the nitrogen doped TiO2thin films can be better. Nitrogen droping is favor of forming Anatase, improving the films’ crystallinity, increasing the hydrophilicity of the film. The hydrophilicity of the nitrogen doped TiO2thin films can be maintain for about20days in the dark and can recover under visible light irradiation, however, The hydrophilicity of the TiO2thin film can not recover. Nitrogen replaces the oxygen in the TiO2lattice to form β-N atoms, this structure has good hydrophilicity under visible light irradiation.