Design Of The Control System Of A New Electrochemical Micro-Nano Processing Instrument

With the technical innovation and development in the pharmaceutical,biotechnology, aerospace, military and other fields, there is a growing needwith the tiny devices which can perform different functions. Especially thedevelopment of semiconductor technology, the micro-nano fabricationtechnologies put forward higher requirements. This paper studies the novelmicro electrochemical machining (mainly confined etchant layertechnology and agarose gel template wet seal technology) and explores theapplications of the novel electrochemical etching technology to improveetching processing locality and etching accuracy. As well we design thenanosecond electrochemical pulse power and data acquisition card withhigh precision for the actual needs of the project.The paper first analyzes the theory of the novel electrochemicaletching technique and builds the theoretical model. By the analysis of thetheoretical model, it is proved that the novel electrochemical etchingtechnology can improve the accuracy of electrochemical etching validity,and we analyze that the influence of nanosecond pulses applied to novelelectrochemical etching technology to improve etching the locality andetching accuracy.And then we discussed the novel electrochemical nanosecond pulsepower design in the third chapter. We put forward the dual MOSFETswitch pulse power supply design based on the traditional single MOSFETswitch pulse power supply design. The design can eliminate or decreasethe sustaining voltage effectively. Thereby the pulse power supply with this design can improv the quality of the output signal, and improve theaccuracy and quality of the electrochemical etching.In the fourth chapter we study the circuit design of the high-precisiondata acquisition card which is used in the novel electrochemicalmicro-nano-fabrication instrument. The data acquisition card using thePCI bus can effectively improve the real-time data processing capabilities.The data acquisition card with24bit ADC chip ADS1256and20-bit DACchip AD5791application meets the requirements of high-precision dataacquisition card.In the fifth chapter we do the etching experiments using the novelelectrochemical etching techniques on the novel electrochemicalmicro-nano-fabrication instrument. Mainly we do some etchingexperiments using CELT on GaAs and do some etching experiments byE-WETS technology on aluminum, and GaAs. By the analysis ofexperimental results, we find that confined etchant layer technology andwet seal technology can improve a given domain and etching accuracy ofelectrochemical etching, and the novel electrochemical etching techniquehas a relatively high etching rate.